G03F 7/70116
Off-axis setting using a programmable means
Official title: {Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets}
G03F7/70116 (Off-axis setting using a programmable means) appears on 331 US grants and 425 published applications in this corpus.
Search patents in G03F- Granted patents
- 331
- Published applications
- 425
- Assignees
- 39
- Inventors
- 474
- Latest grant
- 18 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2001 | 3 | 0 |
| 2002 | 0 | 0 |
| 2003 | 1 | 3 |
| 2004 | 2 | 4 |
| 2005 | 4 | 6 |
| 2006 | 4 | 7 |
| 2007 | 2 | 5 |
| 2008 | 2 | 8 |
| 2009 | 4 | 26 |
| 2010 | 7 | 20 |
| 2011 | 5 | 23 |
| 2012 | 8 | 28 |
| 2013 | 18 | 17 |
| 2014 | 17 | 25 |
| 2015 | 32 | 48 |
| 2016 | 38 | 33 |
| 2017 | 46 | 29 |
| 2018 | 46 | 24 |
| 2019 | 30 | 15 |
| 2020 | 16 | 7 |
| 2021 | 11 | 8 |
| 2022 | 7 | 12 |
| 2023 | 8 | 12 |
| 2024 | 3 | 15 |
| 2025 | 11 | 27 |
| 2026 | 6 | 23 |
By publication year. 2026 runs to 8 Oct.
Recent patents
- Microelectromechanical apparatus with heating element18 Aug 2026US 12,710,619 B2Carl Zeiss SMT GmbH
- EUV multi-mirror arrangement30 Jun 2026US 12,669,753 B2Carl Zeiss SMT GmbH
- High accuracy temperature-compensated piezoresistive position sensing system2 Jun 2026US 12,645,069 B2ASML Netherlands B. V.
- Light wave phase interference improvement of digital micromirror device by means of mechanically stressing the device package10 Mar 2026US 12,571,984 B2APPLIED Materials.Inc.
- Lithography system and methods10 Mar 2026US 12,572,080 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Optical system for a projection exposure apparatus, and method for specifying an illumination pupil13 Aug 2026US 2026/0235866 A1
- Measurement system, measurement method with the aid of such a measurement system, and projection exposure apparatus comprising such a measurement system6 Aug 2026US 2026/0227714 A1
- Lithographic apparatus, method of increasing plasma concentration, and method of manufacturing devices6 Aug 2026US 2026/0231313 A1ASML Netherlands B. V.
- Illumination optical unit for projection lithography, and method for monitoring such an illumination optical unit30 Jul 2026US 2026/0219579 A1
- Facet mirror for an illumination optical unit for projection lithography suitable for use as first facet mirror30 Jul 2026US 2026/0219580 A1
Most cited
By later US patents
- Method and apparatus for shaping and/or orienting radiation irradiating a microlithographic substrate79US 6,577,379 B1Micron Technology, Inc. · 2003
- Lithographic apparatus, device manufacturing method, device manufactured thereby, control system, computer program, and computer program product71US 6,737,662 B2ASML Netherlands B. V. · 2004
- Lithography method and system with adjustable reflector65US 6,977,718 B1Advanced Micro Devices, Inc. · 2005
- Exposure apparatus including micro mirror array and exposure method using the same49US 7,061,582 B2Samsung Electronics Co., Ltd. · 2006
- Lithographic apparatus, device manufacturing method and device manufactured thereby, control system33US 7,015,491 B2ASML Netherlands B. V. · 2006