Facet mirror for an illumination optical unit for projection lithography suitable for use as first facet mirror

An illumination optical unit, comprising:

• a first facet mirror;
• a second facet mirror;
• and
• a transfer optical unit,
• wherein:
• the illumination optical unit is configured so that individual mirror groups of the first facet mirror, as first facets, are imageable at least into partial fields of an object field of the illumination optical unit via the transfer optical unit, an object being arrangeable in the object field and being displaceable in an object displacement direction through the object field during a projection exposure;
• the first facet mirror comprises:
• a regular array arrangement of individual mirror units, each individual mirror unit comprising a sub-array of individual mirrors;
• and
• first and second coating types of the individual mirror units
• the first coating type comprises individual mirror units which, in a neutral position, are optimized for a first angle of incidence of illumination light on the individual mirror units of this coating type;
• the second coating type comprises individual mirror units which, in the neutral position, are optimized for a second angle of incidence of the illumination light on the individual mirror units of this coating type;
• the angles of incidence of the first and second coating types differ from one another;
• the second facet mirror is configured to reflectively guide the illumination light reflected by the first facet mirror to the object field;
• the second facet mirror comprises second facets configured to image groups of individual mirrors of the first facet mirror, as first facets, at least into partial fields of the object field via illumination light component beams;
• at least two target surface regions are present on the second facet mirror along a field height arrangement coordinate of the second facet mirror of the illumination optical unit;
• the field height arrangement coordinate corresponds to a field height coordinate of the first facet mirror which is imageable via the illumination optical unit into a field height coordinate perpendicular to the object displacement direction coordinate of the object field;
• and
• the target surface regions are configured to guide illumination light via a pre-tilt type in each case and/or via a coating type of the first facet mirror in each case.

An illumination optical unit, comprising:

• a first facet mirror comprising first facets configured to reflectively guide component beams of illumination light;
• a transfer optical unit;
• and
• a second facet mirror configured to reflectively guide the illumination light reflected by the first facet mirror to an object field of the illumination optical unit,
• wherein:
• the illumination optical unit is configured so the first facets of the first facet mirror are imageable at least into partial fields of the object field of the illumination optical unit via the transfer optical unit, which includes second facets of the second facet mirror;
• an object is arrangeable in the object field and is displaceable in an object displacement direction through the object field (8) during a projection exposure;
• the second facet mirror comprises:
• first and second pre-tilt types of the second facets, the first pre-tilt type comprising second facets which, in a neutral position, have a first pre-tilt angle relative to a base tilt angle specified by a carrier geometry of the facet mirror, the second pre-tilt type comprising second facets which, in the neutral position, have a second pre-tilt angle relative to the base tilt angle, the first and second pre-tilt angles differing from one another;
• and/or
• first and second coating types of the second facets, the first coating type comprising second facets and/or individual mirror units optimized for a first interval of angles of incidence of illumination light on the second facets and/or the individual mirror units of the first coating type, the second coating type comprising second facets and/or individual mirror units optimized for a second interval of angles of incidence of the illumination light on the second facets and/or the individual mirror units of the second coating type, the first and second interval angles of incidence differing from one another;
• wherein the second facets of the second facet mirror are configured to image first facets at least into partial fields of the object field via illumination light component beams;
• at least two initial surface regions are present on the first facet mirror along a field height coordinate of the first facet mirror of the illumination optical unit;
• the field height coordinate is imageable via the illumination optical unit into a field height coordinate perpendicular to the object displacement coordinate of the object field;
• and
• each of the initial surface regions are configured to guide illumination light component beams via a pre-tilt type in each case and/or via a coating type of the second facet mirror in each case.