Exposure apparatus including micro mirror array and exposure method using the same

A method of exposing a photoresist, the method comprising:

• generating exposure light;
• providing a photomask having a pattern that is to be transferred to the photoresist;
• and
• reflecting the exposure light along an optical axis through the photomask and towards the photoresist with an array of micro mirrors disposed side-by-side;
• wherein the array of micro mirrors directs the exposure light onto the photomask at oblique angles relative to a plane of the photomask to prevent 0th order incident light from reaching the photomask.

A method of exposing a photoresist, the exposure method comprising:

• providing a photomask having a pattern to be transferred to the photoresist;
• quantifying information regarding the pattern to be transferred to the photoresist;
• generating exposure light;
• determining, from the information regarding the pattern of the photomask, a form for the shape of the exposure light to be directed through the photomask and onto the photoresist;
• and
• reflecting rays of the exposure light, along an optical axis through the photomask, with an array of micro mirrors disposed side-by-side and oriented to shape the exposure light into said form;
• wherein the array of micro mirrors directs the exposure light onto the photomask at oblique angles relative to a plane of the photomask to prevent 0th order incident light from reaching the photomask.