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US 6,737,662 B2Granted
Lithographic apparatus, device manufacturing method, device manufactured thereby, control system, computer program, and computer program product
AssigneeASML Netherlands B.V.
InventorsHeine Melle Mulder, Jan Bernard Plechelmus Van Schoot, Markus Franciscus Antonius Eurlings, Antonius Johannes Josephus Van Dijsseldonk, Marcel Dierichs
Life of this patent
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Abstract
A lithographic projection system has an illumination system. A plurality of directing elements reflect different sub-beams of an incident projection beam into adjustable, individually controllable directions. By using of re-directing optics any desired spatial intensity distribution of the projection beam can be produced in its cross-sectional plane.
Claims23
A lithographic projection apparatus, comprising:
- a radiation system constructed and arranged to provide a projection beam of radiation;
- a support structure constructed and arranged to support a patterning device, the patterning device constructed and arranged to pattern the projection beam according to a desired pattern;
- a substrate table to hold a substrate;
- a projection system constructed and arranged to project the patterned beam onto a target portion of the substrate;
- wherein the radiation system comprises an illumination system configured to define the intensity distribution of the projection beam, the illumination system comprises a steering device constructed and arranged to individually steer different parts of an incoming radiation beam into different directions to provide a desired angular intensity distribution of the projection beam at the patterning device, said steering device comprising a plurality of discrete reflectors, each for steering a part of the incoming beam, and whose orientation can be controlled individually to direct the corresponding part of the incoming beam into a desired direction.
2 more elements
A device manufacturing method, comprising:
- providing a substrate at least partially with a layer of radiation-sensitive material;
- providing at least one projection beam of radiation;
- modifying the intensity distribution of the projection beam;
- using a patterning device to endow the modified projection beam with a pattern in its cross-section;
- projecting the patterned beam of radiation onto a target which comprises at least a part of the radiation-sensitive material, wherein the modification of the intensity distribution of the projection beam includes controlling the direction into which the radiation propagates, wherein the projection beam comprises a plurality of sub-beams, wherein at least some of the sub-beams are steered into different directions using a plurality of discrete reflectors, and wherein the discrete reflectors are individually controlled to direct the corresponding sub-beam into a desired direction.
2 more elements
Dependencies are inferred from the claim text.