EUV multi-mirror arrangement
AssigneeCarl Zeiss SMT GmbH
InventorsRalf Ameling, Fabian Haacker, Markus Holz, Johannes Eisenmenger
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AssigneeCarl Zeiss SMT GmbH
InventorsRalf Ameling, Fabian Haacker, Markus Holz, Johannes Eisenmenger
Estimating the term…
An EUV multi-mirror arrangement comprises a multiplicity of mirror units arranged one next to the other in a grid arrangement on a carrier structure. Each mirror unit has a base element and, opposite the base element, an individually tiltable mirror element which has a mirror substrate that carries on a front face facing away from the base element a reflection coating for forming a mirror surface that reflects EUV radiation. Arranged between its base element and the mirror element, each mirror unit includes components of a suspension system for movably mounting the mirror element on the base element, actuators of an actuator system for producing movements of the mirror element in relation to the base element as a reaction to the reception of control signals, and sensors of a sensor system for capturing the position of the mirror elements. The actuator system has piezoelectric actuators. The sensor system has capacitive sensors.
An extreme ultraviolet (EUV) multi-mirror arrangement, comprising:
An extreme ultraviolet (EUV) multi-mirror arrangement, comprising:
An extreme ultraviolet (EUV) multi-mirror arrangement, comprising:
Dependencies are inferred from the claim text.