Method and apparatus for shaping and/or orienting radiation irradiating a microlithographic substrate

A method for irradiating a radiation-sensitive material of a microlithographic substrate, comprising:

• directing a beam of radiation along a radiation path toward a reflective surface, the beam of radiation having a first shape and a first intensity uniformity in a plane generally transverse to the first direction, the beam of radiation further having a first intensity;
• changing a shape of the radiation beam from the first shape to a second shape different than the first shape by inclining a first portion of the reflective surface relative to a second portion of the reflective surface and reflecting the beam from the reflective surface toward a microlithographic substrate, the beam with the second shape having a second intensity uniformity less than the first intensity uniformity;
• directing the radiation beam away from the reflective surface with a second intensity at least approximately the same as the first intensity;
• changing an angle of at least a portion of the radiation beam relative to the radiation path by impinging the radiation beam on a reflective or refractive optical element after changing the shape of the beam from the first shape to the second shape;
• impinging the beam on a reticle;
• and
• impinging the beam on the radiation sensitive material of the microlithographic substrate after changing the shape from the first shape to the second shape and after impinging the beam on the reticle.

A method for irradiating a radiation-sensitive material of the microlithographic substrate, comprising:

• directing a beam of radiation having a first intensity uniformity toward a reticle positioned to pass zeroth diffraction order radiation in a first direction toward the microlithographic substrate, and pass first diffraction order radiation in a second direction toward the microlithographic substrate, the second direction being inclined at a diffraction angle relative to the first direction;
• directing at least a portion of the radiation impinging on the reticle away from the first direction and toward the second direction by impinging the radiation on a reflective surface, inclining a first portion of the reflective surface relative to a second portion of the reflective surface, and reflecting the beam from the reflective surface to an optical element and toward the reticle, with the beam having a second intensity uniformity less than the first intensity uniformity;
• impinging the beam on the reticle;
• and
• directing the beam from the reticle to the radiation sensitive material of the microlithographic substrate after impinging the beam on the reticle.

A method for irradiating a microlithographic substrate, comprising:

• positioning a first microlithographic substrate on a support member;
• directing a radiation beam along a radiation path toward the first microlithographic substrate, the radiation beam having a first shape in a plane generally transverse to the radiation path;
• moving a first portion of a reflective surface relative to a second portion of the reflective surface to define a first configuration of the reflective surface,
• correlating the first configuration with a first pattern of optical features of a first reticle;
• changing a shape of the radiation beam from the first shape to a second shape different than the first shape by reflecting the radiation beam from the reflective surface while the reflective surface is in the first configuration;
• directing the radiation beam with the second shape to an optical element, to the first reticle and to the first microlithographic substrate;
• replacing the first reticle with a second reticle having a second pattern of optical features;
• accommodating differences between the first reticle and the second reticle by moving the first portion of the reflective surface relative to the second portion to place the reflective surface in a second configuration different than the first configuration;
• correlating the second configuration with the second pattern of optical features of the second reticle;
• changing a shape of the radiation beam to a third shape different than the second shape by reflecting the radiation beam from the reflective surface while the reflective surface is in the second configuration;
• and
• directing the radiation beam with the third shape to the optical element, to the second reticle and to the second microlithographic substrate.

A method for adjusting an intensity distribution of radiation directed to a radiation-sensitive material of a microlithographic substrate, comprising:

• selecting a target distribution of radiation angles relative to a reticle plane of a reticle;
• directing a radiation beam along a radiation path;
• reflecting the radiation beam from a reflective surface, to an optical element and toward a reticle, the radiation beam having a first intensity uniformity and a first distribution of radiation angles relative to the reticle;
• determining an error between the first distribution and the target distribution;
• and
• until the first distribution is at least approximately the same as the target distribution, changing the first distribution by inclining a first portion of the reflective surface relative to a second portion of the reflective surface to change a shape of the radiation beam in a plane generally transverse to the radiation path, and reflecting the radiation to the optical element toward the reticle, with the beam having a second intensity uniformity less than the first intensity uniformity.

An apparatus for irradiating a radiation-sensitive material of a microlithographic substrate, comprising:

• a support member configured to releasably support the microlithographic substrate;
• a radiation source configured to emit a beam of radiation directed along a radiation path toward the support member;
• a reticle positioned along the radiation path, the reticle being configured to pass the radiation toward the substrate support;
• a reflective surface positioned along the radiation path, the reflective surface having a first portion and a second portion with the first portion movable relative to the second portion to change a shape of the radiation beam in a plane generally transverse to the radiation path from a first shape and a first intensity uniformity to a second shape different than the first shape wherein the beam with the second shape has a second intensity uniformity less than the first intensity uniformity;
• an optical element positioned between the reflective surface and the support member to receive radiation from the reflective surface and direct at least some of the radiation at an angle relative to the radiation path;
• and
• a controller operatively coupled to the reflective surface, the controller being configured to direct the first portion of the reflective surface to move relative to the second portion to change the shape of the radiation beam from the first shape to the second shape.

An apparatus for irradiating a radiation-sensitive surface of a microlithographic substrate, comprising:

• a support member configured to releasably support the microlithographic substrate;
• a radiation source configured to emit a beam of radiation along a radiation path directed toward the support member;
• a reticle positioned along the radiation path between the radiation source and the support member, the reticle being positioned to pass the radiation toward the substrate support;
• a reflective surface positioned along the radiation path between the reticle and the radiation source, the reflective surface having a first portion and a second portion with the first portion movable relative to the second portion to change a shape of the radiation beam in a plane generally transverse to the radiation path from a first shape and a first intensity uniformity to a second shape different than the first shape wherein the beam with the second shape has a second intensity uniformity less than the first intensity uniformity;
• an optical element positioned between the reflective surface and the support member to receive radiation from the reflective surface and direct at least some of the radiation at an angle relative to the radiation path;
• and
• a controller operatively coupled to the reflective surface, the controller being configured to direct the first portion of the reflective surface to move relative to the second portion to change the shape of the radiation beam from the first shape to the second shape.