G03F 7/70108
Off-axis setting using a light-guiding element
Official title: {Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides}
G03F7/70108 (Off-axis setting using a light-guiding element) appears on 335 US grants and 313 published applications in this corpus.
Search patents in G03F- Granted patents
- 335
- Published applications
- 313
- Assignees
- 57
- Inventors
- 356
- Latest grant
- 1 Oct 2024
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1992 | 3 | 0 |
| 1993 | 1 | 0 |
| 1994 | 8 | 0 |
| 1995 | 6 | 0 |
| 1996 | 2 | 0 |
| 1997 | 13 | 0 |
| 1998 | 8 | 0 |
| 1999 | 4 | 0 |
| 2000 | 3 | 0 |
| 2001 | 16 | 6 |
| 2002 | 12 | 19 |
| 2003 | 14 | 20 |
| 2004 | 15 | 32 |
| 2005 | 18 | 20 |
| 2006 | 18 | 22 |
| 2007 | 15 | 21 |
| 2008 | 18 | 25 |
| 2009 | 13 | 37 |
| 2010 | 14 | 10 |
| 2011 | 10 | 21 |
| 2012 | 11 | 7 |
| 2013 | 14 | 10 |
| 2014 | 13 | 13 |
| 2015 | 23 | 12 |
| 2016 | 20 | 9 |
| 2017 | 16 | 12 |
| 2018 | 10 | 4 |
| 2019 | 9 | 5 |
| 2020 | 3 | 2 |
| 2021 | 1 | 1 |
| 2022 | 0 | 2 |
| 2023 | 2 | 1 |
| 2024 | 2 | 1 |
| 2025 | 0 | 1 |
By publication year. Applications have been published since 2001.
Recent patents
- Exposure apparatus, exposure method, and manufacturing method for product1 Oct 2024US 12,105,430 B2Canon Kabushiki Kaisha
- Projection exposure method and projection lens with setting of the pupil transmission20 Feb 2024US 11,906,904 B2Carl Zeiss SMT GmbH
- Exposure apparatus, exposure method, and manufacturing method for product5 Dec 2023US 11,835,863 B2Canon Kabushiki Kaisha
- Maskless photolithography devices, methods, and systems31 Jan 2023US 11,567,411 B2NanoPath, Inc.
- Projection exposure method and projection lens with setting of the pupil transmission12 Oct 2021US 11,143,967 B2Carl Zeiss SMT GmbH
- Laser processing system, laser processing method, and method for manufacturing electronic device14 Aug 2025US 2025/0258438 A1Gigaphoton Inc.
- Exposure apparatus, exposure method, and manufacturing method for product7 Mar 2024US 2024/0077806 A1Canon Kabushiki Kaisha
- Maskless photolithography devices, methods, and systems1 Jun 2023US 2023/0168588 A1NanoPath, Inc.
- Exposure apparatus, exprosure method, and manufacturing method for product29 Dec 2022US 2022/0413392 A1Canon Kabushiki Kaisha
- Projection exposure method and projection lens with setting of the pupil transmission27 Jan 2022US 2022/0026814 A1Carl Zeiss SMT GmbH
Most cited
By later US patents
- Illuminating arrangement including a zoom objective incorporating two axicons158US 5,675,401 ACarl-Zeiss-Stiftung · 1997
- Illumination device including amplitude-division and beam movements157US 5,153,773 ACanon Kabushiki Kaisha · 1992
- Illumination system and exposure apparatus having the same154US 6,259,512 B1Canon Kabushiki Kaisha · 2001
- Illumination device including an optical integrator defining a plurality of secondary light sources and related method132US 5,463,497 ACanon Kabushiki Kaisha · 1995
- Hybrid illumination system for use in photolithography131US 5,631,721 ASVG Lithography Systems, Inc. · 1997