Maskless photolithography devices, methods, and systems
AssigneeNanoPath, Inc.
InventorKevin Donahue
Life of this patent
Estimating the term…
Abstract
A device (100) includes a light source (130) and a light guide (110). The light source (130) is configured to emit photoresist-curative electromagnetic radiation. The light guide (110) is arranged to receive the photoresist-curative electromagnetic radiation from the light source (130) and to guide the received radiation by total internal reflection, the light guide (110) including a pattern of emission points (210) on at least one surface of the light guide (110), the emission points (210) emitting the photoresist-curative electromagnetic radiation out of the light guide (110) by frustration of total internal reflection caused by the emission points (210).
Claims19
A device comprising:
- a light source configured to emit photoresist-curative electromagnetic radiation;
- and
- a light guide arranged to receive the photoresist-curative electromagnetic radiation from the light source and to guide the received radiation by total internal reflection, the light guide including a pattern of emission points on at least one surface of the light guide, the emission points including a deposited light diffusing region adjacent the at least one surface, the emission points emitting the photoresist-curative electromagnetic radiation out of the light guide by frustration of total internal reflection caused by the emission points.
A device comprising:
- a light source configured to emit photoresist-curative electromagnetic radiation;
- and
- a light guide arranged to receive the photoresist-curative electromagnetic radiation from the light source and to guide the received radiation by total internal reflection, the light guide including a film on at least one surface of the light guide, the film having a pattern of emission points, the emission points including a deposited light diffusing region adjacent the film, the emission points emitting the photoresist-curative electromagnetic radiation out of the light guide by frustration of total internal reflection caused by the emission points.
A method of exposing photoresist to photoresist-curative electromagnetic radiation, comprising:
- disposing the photoresist on a first surface of a light guide, at least one surface of the light guide having a pattern of emission points;
- injecting photoresist-curative electromagnetic radiation into the light guide such that the photoresist-curative electromagnetic radiation is guided within the light guide by total internal reflection, the emission points including a deposited light diffusing region adjacent the at least one surface, the emission points emitting the photoresist-curative electromagnetic radiation into the photoresist by frustration of total internal reflection caused by the emission points;
- and
- developing the photoresist to form a patterned photoresist.
Dependencies are inferred from the claim text.