Maskless photolithography devices, methods, and systems
AssigneeNanoPath, Inc.
InventorKevin Donahue
Life of this patent
Estimating the term…
Abstract
A device includes a light source and a light guide. The light source is configured to emit photoresist-curative electromagnetic radiation. The light guide is arranged to receive the photoresist-curative electromagnetic radiation from the light source and to guide the received radiation by total internal reflection, the light guide including a pattern of emission points on at least one surface of the light guide, the emission points emitting the photoresist-curative electromagnetic radiation out of the light guide by frustration of total internal reflection caused by the emission points.
Claims20
A device comprising:
- a light source configured to emit photoresist-curative electromagnetic radiation;
- and
- a light guide arranged to receive the photoresist-curative electromagnetic radiation from the light source and to guide the received radiation by total internal reflection, the light guide including a pattern of emission points on at least one surface of the light guide, the emission points emitting the photoresist-curative electromagnetic radiation out of the light guide by frustration of total internal reflection caused by the emission points, wherein the emission points include an implanted region of the at least one surface.
A device comprising:
- a light source configured to emit photoresist-curative electromagnetic radiation;
- and
- a light guide arranged to receive the photoresist-curative electromagnetic radiation from the light source and to guide the received radiation by total internal reflection, the light guide including a pattern of emission points on at least one surface of the light guide, the emission points emitting the photoresist-curative electromagnetic radiation out of the light guide by frustration of total internal reflection caused by the emission points, wherein the deposited light diffusing region includes a metal oxide.
A device comprising:
- a light source configured to emit photoresist-curative electromagnetic radiation;
- and
- a light guide arranged to receive the photoresist-curative electromagnetic radiation from the light source and to guide the received radiation by total internal reflection, the light guide including a pattern of emission points on at least one surface of the light guide, the emission points emitting the photoresist-curative electromagnetic radiation out of the light guide by frustration of total internal reflection caused by the emission points, and
- a photoresist disposed on a first surface of the light guide, the emission points formed on a second surface of the light guide opposite to the first surface, wherein portions of the photoresist-are cured by the photoresist-curative electromagnetic radiation emitted at the emission points
A device comprising:
- a light source configured to emit photoresist-curative electromagnetic radiation;
- and
- a light guide arranged to receive the photoresist-curative electromagnetic radiation from the light source and to guide the received radiation by total internal reflection, the light guide including a film on at least one surface of the light guide, the film having a pattern of emission points, the emission points emitting the photoresist-curative electromagnetic radiation out of the light guide by frustration of total internal reflection caused by the emission points;
- and
- a photoresist disposed on a first surface of the light guide, the emission points formed on the film on a second surface of the light guide opposite to the first surface, wherein portions of the photoresist-are cured by the photoresist-curative electromagnetic radiation emitted at the emission points.
Dependencies are inferred from the claim text.