Back to results
US 11,906,904 B2Granted
Projection exposure method and projection lens with setting of the pupil transmission
AssigneeCarl Zeiss SMT GmbH
InventorToralf Gruner
Life of this patent
Estimating the term…
Abstract
A projection exposure method for exposing a radiation-sensitive substrate with at least one image of a pattern of a mask is provided in which an illumination field of the mask is illuminated by illumination radiation with an operating wavelength λ that was provided by an illumination system.
Claims27
A system, comprising:
- a projection lens comprising a plurality of optical elements in a beam path of a working wavelength of electromagnetic radiation to image a pattern arranged in an object surface of the projection lens into an image surface of the projection lens via the operating wavelength of the electromagnetic radiation, the plurality of optical elements comprising a replaceable optical element;
- a correction optical element;
- and
- an interchange device configured to replace the replaceable optical element with the correction optical element,
- wherein:
- the correction optical element comprises a body comprising a surface which comprises regions consisting of diffraction structures configured to diffract an operating wavelength of electromagnetic radiation;
- the regions of the surface of the correction element consist of diffraction structures comprise a first region of the surface of the correction element and a second region of the surface of the correction element;
- the first region of the surface of the correction element consists of first diffraction structures having a first density of diffraction structures;
- the second region of the surface of the correction element consists of second diffraction structures having a second density of diffraction structures;
- the second density of diffraction structures is different from the first density of diffraction structures;
- and
- the operating wavelength of the electromagnetic radiation is in the DUV range.
9 more elements
A system, comprising:
- a projection lens comprising a plurality of optical elements in a beam path of a working wavelength of electromagnetic radiation to image a pattern arranged in an object surface of the projection lens into an image surface of the projection lens via the operating wavelength of the electromagnetic radiation, the plurality of optical elements comprising a replaceable optical element
- a correction optical element;
- and
- an interchange device configured to replace the replaceable optical element with the correction optical element,
- wherein:
- the correction optical element comprises a body comprising a surface which comprises regions consisting of diffraction structures configured to diffract an operating wavelength of electromagnetic radiation;
- the regions of the surface of the correction element consist of diffraction structures comprise a first region of the surface of the correction element and a second region of the surface of the correction element
- the first region of the surface of the correction element consists of first diffraction structures having a first density of diffraction structures;
- the second region of the surface of the correction element consists of second diffraction structures having a second density of diffraction structures;
- the second density of diffraction structures is different from the first density of diffraction structures;
- and
- the operating wavelength of the electromagnetic radiation is in the EUV range.
9 more elements
An apparatus, comprising:
- an illumination system configured to illuminate an object surface with a working wavelength of electromagnetic radiation;
- a projection lens comprising a plurality of optical elements in a beam path of the operating wavelength of the electromagnetic radiation to image a pattern arranged in the object surface into an image surface of the projection lens via the operating wavelength of the electromagnetic radiation, the plurality of optical elements comprising a replaceable optical element;
- a correction optical element;
- and
- an interchange device configured to replace the replaceable optical element with the correction optical element,
- wherein:
- the correction optical element comprises a body comprising a surface which comprises regions consisting of diffraction structures configured to diffract an operating wavelength of electromagnetic radiation;
- the regions of the surface of the correction element consist of diffraction structures comprise a first region of the surface of the correction element and a second region of the surface of the correction element;
- the first region of the surface of the correction element consists of first diffraction structures having a first density of diffraction structures;
- the second region of the surface of the correction element consists of second diffraction structures having a second density of diffraction structures;
- the second density of diffraction structures is different from the first density of diffraction structures;
- and
- the operating wavelength of the electromagnetic radiation is in the DUV range.
10 more elements
Dependencies are inferred from the claim text.