Illumination device including an optical integrator defining a plurality of secondary light sources and related method

An exposure method comprising the steps of:

• dividing light from a light source into a plurality of light beams;
• projecting the plurality of beams onto an optical integrator to define a plurality of light sources by the optical integrator;
• changing the position of incidence of each of the plurality of light beams upon the optical integrator, toward or away from the center of the optical integrator;
• and
• illuminating, after said changing step, an original with the plurality of light sources defined by the optical integrator, to transfer a pattern of the original onto a substrate.

A semiconductor device manufacturing method comprising the steps of:

• dividing light from a light source into a plurality of light beams;
• projecting the plurality of light beams onto an optical integrator to define a plurality of secondary light sources;
• changing the position of incidence of each of the plurality of light beams on the optical integrator, toward or away from the center of the optical integrator;
• and
• illuminating, after said changing step, a mask with the plurality of secondary light sources defined by the optical integrator, to transfer a pattern of the mask onto a wafer.

An exposure apparatus comprising:

• means for providing a plurality of light beams;
• an illumination optical system including an optical integrator, said optical integrator receiving the plurality of light beams to define a plurality of secondary light sources for exposing a substrate;
• and
• changing means for changing the position of incidence of each of the plurality of light beams upon said optical integrator, said changing means shifting the position of incidence of each beam toward or away from the center of said optical integrator.

An exposure apparatus for exposing a substrate to a mask pattern, said apparatus comprising:

• a light source for producing light;
• an optical integrator for forming a plurality of secondary light sources with light from said light source;
• an irradiating optical system for irradiating said optical integrator with the light from said light source, said irradiating optical system comprising first optical means for converting the light from said light source into an off-axis light beam having an optical path deviated from an optical axis of said irradiating optical system, and second optical means for changing a position of incidence of each ray of the off-axis light beam on the optical integrator, toward or away from a center of said optical integrator;
• and
• a directing optical system for directing light beams from the secondary light sources, formed by said optical integrator, onto the mask pattern.

An exposure apparatus for exposing a substrate to a mask pattern, said apparatus comprising:

• secondary light source forming means for forming a plurality of secondary light sources;
• irradiating means for irradiating said secondary light source forming means with light, said irradiating means comprising means for providing off-axis light having an optical path deviated from an optical axis of said irradiating means, wherein said irradiating means is arranged so that a position of incidence of each ray of the off-axis light upon said secondary light sources forming means is changeable, toward or away from a center of said secondary light source forming means;
• and
• means for directing light beams from the secondary light sources onto the mask pattern.