Projection exposure method and projection lens with setting of the pupil transmission

A method, comprising:

• a) choosing a position of a correction surface of a correction element in an imaging beam path of an optical imaging system, the correction surface to be provided with diffraction structures;
• b) ascertaining an assignment between the position of the correction surface in the imaging beam path and a field-dependent pupil location;
• c) measuring a local intensity distribution in an exit pupil for different field points in an image field depending on a field location in the image field;
• d) ascertaining an intended deflection profile representing a sought-after local distribution of a masking of radiation intensity via diffraction to obtain an intended profile of the local intensity distribution in the exit pupil;
• e) ascertaining a first spectrum with angles of incidence of rays incident at an area location of the correction surface, a second spectrum with angles of reflection of rays that emanate from the area location in the direction of the image field, and a third spectrum with angles of reflection of rays that lead from the area location in the direction of an uncritical region;
• f) ascertaining structure periods and structure orientations of diffraction structures that produce a diffraction into angles in a region of the third spectrum for rays at the operating wavelength;
• g) ascertaining a spatially dependent diffraction intensity of the diffraction structures that leads to the intended deflection profile being obtained;
• h) producing diffraction structures at the correction surface depending on results of the steps f) and g) to yield the correction element comprising the diffraction structures;
• and
• i) replacing an optical element in the optical imaging system with the correction element so that the diffraction structures are in the position of the correction surface.