G03F 7/70075
Homogenization of illumination intensity in the mask plane by using an integrator
Official title: {Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection}
G03F7/70075 (Homogenization of illumination intensity in the mask plane by using an integrator) appears on 592 US grants and 619 published applications in this corpus.
Search patents in G03F- Granted patents
- 592
- Published applications
- 619
- Assignees
- 124
- Inventors
- 862
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 2 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 2 | 0 |
| 1986 | 1 | 0 |
| 1987 | 3 | 0 |
| 1988 | 4 | 0 |
| 1989 | 3 | 0 |
| 1990 | 3 | 0 |
| 1991 | 3 | 0 |
| 1992 | 5 | 0 |
| 1993 | 6 | 0 |
| 1994 | 4 | 0 |
| 1995 | 9 | 0 |
| 1996 | 3 | 0 |
| 1997 | 17 | 0 |
| 1998 | 5 | 0 |
| 1999 | 5 | 0 |
| 2000 | 9 | 0 |
| 2001 | 21 | 4 |
| 2002 | 12 | 23 |
| 2003 | 14 | 29 |
| 2004 | 22 | 36 |
| 2005 | 25 | 27 |
| 2006 | 21 | 22 |
| 2007 | 16 | 27 |
| 2008 | 19 | 20 |
| 2009 | 12 | 32 |
| 2010 | 15 | 19 |
| 2011 | 8 | 20 |
| 2012 | 15 | 24 |
| 2013 | 18 | 13 |
| 2014 | 15 | 24 |
| 2015 | 21 | 41 |
| 2016 | 27 | 35 |
| 2017 | 47 | 32 |
| 2018 | 46 | 24 |
| 2019 | 36 | 18 |
| 2020 | 15 | 24 |
| 2021 | 25 | 13 |
| 2022 | 15 | 16 |
| 2023 | 10 | 16 |
| 2024 | 8 | 22 |
| 2025 | 14 | 31 |
| 2026 | 10 | 27 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Methods of patterning a photoresist, and related patterning systems25 Aug 2026US 12,717,239 B2Liteq B.V.
- Component of an optical system14 Jul 2026US 12,681,390 B2Carl Zeiss SMT GmbH
- Optical system, lithography apparatus and method16 Jun 2026US 12,656,693 B2Carl Zeiss SMT GmbH
- Mask exposure system and mask exposure method9 Jun 2026US 12,650,652 B2Samsung Electronics Co., Ltd.
- EUV light uniformity control apparatus, EUV exposure equipment including the same, and method of controlling EUV light uniformity by using the control apparatus5 May 2026US 12,619,156 B2Samsung Electronics Co., Ltd.
- Optical system, method of use, and method of fabrication1 Oct 2026US 2026/0299429 A1xLight Inc.
- Optical system for a projection exposure apparatus, and method for specifying an illumination pupil13 Aug 2026US 2026/0235866 A1
- Tunnel optic beam homogenizer for euv illumination systems13 Aug 2026US 2026/0235961 A1KLA Corporation
- Out-Coupling Techniques for Accelerator-based Light Sources in Semiconductor Metrology and Inspection Applications13 Aug 2026US 2026/0235966 A1yTools Inc.
- Measurement system, measurement method with the aid of such a measurement system, and projection exposure apparatus comprising such a measurement system6 Aug 2026US 2026/0227714 A1
Most cited
By later US patents
- Lithography system employing a solid immersion lens588US 5,121,256 AThe Board of Trustees of the Leland Stanford Junior University · 1992
- Illumination optical arrangement174US 4,619,508 ANippon Kogaku K. K. · 1986
- Laser beam homogenizer161US 4,744,615 AInternational Business Machines Corporation · 1988
- Illuminating arrangement including a zoom objective incorporating two axicons158US 5,675,401 ACarl-Zeiss-Stiftung · 1997
- Illumination system and exposure apparatus having the same154US 6,259,512 B1Canon Kabushiki Kaisha · 2001