Out-Coupling Techniques for Accelerator-based Light Sources in Semiconductor Metrology and Inspection Applications
AssigneeyTools Inc.
InventorWilliam A Schumaker
Life of this patent
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Abstract
Out-coupling techniques for an accelerator-based EUV/SXR light source. One or more optics are designed to “pick off” and redirect one or more portions of the source light beam, namely, specified harmonics, for use in semiconductor metrology and inspection applications.
Claims20
A system for coupling a light beam that is output from an accelerator-based light source for use in a semiconductor metrology or inspection system, wherein the light beam is comprised of a plurality of harmonics, each harmonic has a known emission pattern corresponding to the harmonic when output from the light source, comprising:
- an optic positioned proximate to the light source and oriented at a specified angle to a beamline of the light source, the optic is configured to either redirect at least one of a plurality of harmonics and to pass a fundamental harmonic of the plurality of harmonics, or to pass at least one of the plurality of harmonics and to redirect the fundamental harmonic.
A system for coupling a light beam that is output from an accelerator-based light source for use in a semiconductor metrology or inspection system, wherein the light beam is comprised of a plurality of harmonics, each harmonic has a known emission pattern corresponding to the harmonic when output from the light source, comprising:
- a plurality of optics positioned proximate to the light source, each of the plurality of optics configured to pick off and redirect one portion of the plurality of harmonics and to pass another portion of the plurality of harmonics.
A method for conditioning a light beam output from an accelerator-based light source for use in a semiconductor metrology or inspection system, wherein the light beam is comprised of a plurality of harmonics, each harmonic has a known emission pattern corresponding to the harmonic when output from the light source, comprising:
- positioning an optic proximate to the output of the light source;
- and
- orienting the optic at a specified angle to a beamline of the light source, the optic designed for reflecting and redirecting at least one harmonic of the plurality of harmonics to a metrology or inspection tool.
Dependencies are inferred from the claim text.