Optical system, lithography apparatus and method

An optical system, comprising:

• a plurality of optical components configured to guide radiation in the optical system;
• a plurality of arrangements, each arrangement comprising an actuator/sensor device assigned to one of the optical components;
• a plurality of control units configured to control the arrangements, each control unit being assigned at least two of the arrangements;
• and
• an interface,
• wherein for each control unit:
• the interface is configured to electrically couple the control unit to the arrangements assigned to the control unit to transmit electrical signals between the control unit and the arrangements assigned to the control unit;
• the electrical signals comprise a data signal and/or electrical energy configured to operate an arrangement assigned to the control unit;
• the interface comprises a bundle of electrical lines for each of the arrangements assigned to the control unit;
• and
• the bundle of electrical lines comprises a number of operating voltage lines and a number of data signal lines, and
• wherein:
• the interface comprises a printed circuit board comprising a plurality of separate electrical planes;
• for each bundle of electrical lines, the electrical lines comprise conductor tracks on the printed circuit board, and the bundle of electrical lines is arranged in a respective plane.