G03F 7/7015
Details of optical elements
Official title: {Details of optical elements}
G03F7/7015 (Details of optical elements) appears on 1,075 US grants and 1,235 published applications in this corpus.
Search patents in G03F- Granted patents
- 1,075
- Published applications
- 1,235
- Assignees
- 194
- Inventors
- 1,759
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 1 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 2 | 0 |
| 1993 | 3 | 0 |
| 1994 | 3 | 0 |
| 1995 | 2 | 0 |
| 1996 | 1 | 0 |
| 1997 | 5 | 0 |
| 1998 | 9 | 0 |
| 1999 | 4 | 0 |
| 2000 | 8 | 0 |
| 2001 | 13 | 3 |
| 2002 | 7 | 19 |
| 2003 | 23 | 32 |
| 2004 | 20 | 45 |
| 2005 | 27 | 46 |
| 2006 | 36 | 47 |
| 2007 | 37 | 66 |
| 2008 | 43 | 42 |
| 2009 | 24 | 39 |
| 2010 | 28 | 39 |
| 2011 | 28 | 48 |
| 2012 | 28 | 36 |
| 2013 | 31 | 42 |
| 2014 | 41 | 60 |
| 2015 | 53 | 48 |
| 2016 | 61 | 62 |
| 2017 | 66 | 51 |
| 2018 | 67 | 60 |
| 2019 | 57 | 67 |
| 2020 | 72 | 95 |
| 2021 | 67 | 57 |
| 2022 | 53 | 54 |
| 2023 | 38 | 57 |
| 2024 | 34 | 48 |
| 2025 | 46 | 38 |
| 2026 | 32 | 34 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Field mirrors for imaging field compression driven photon efficiency and imaging wavefront improvement6 Oct 2026US 12,754,482 B2KLA Corporation
- Mirror, optical system and method for operating an optical system6 Oct 2026US 12,754,483 B2Carl Zeiss SMT GmbH
- Prolonging optical element lifetime in an EUV lithography system22 Sep 2026US 12,743,021 B2ASML Netherlands B. V.
- Optical element, optical arrangement and insert component15 Sep 2026US 12,736,773 B2Carl Zeiss SMT GmbH
- System and method for determining overlay measurement of a scanning target11 Aug 2026US 12,704,790 B2KLA Corporation
- Extreme ultraviolet lithography system8 Oct 2026US 2026/0310108 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Semiconductor system inspection tool and methods of operation1 Oct 2026US 2026/0304585 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Lithography system with non-invasive monitoring and methods24 Sep 2026US 2026/0288012 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Euv mirror with improved optical stability10 Sep 2026US 2026/0267232 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Reticle stage3 Sep 2026US 2026/0259509 A1ASML Netherlands B. V.
Most cited
By later US patents
- Extreme ultraviolet lithography process and mask331US 8,841,047 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2014
- Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source260US 7,196,342 B2Cymer, Inc. · 2007
- Illuminating arrangement including a zoom objective incorporating two axicons158US 5,675,401 ACarl-Zeiss-Stiftung · 1997
- Hybrid illumination system for use in photolithography131US 5,631,721 ASVG Lithography Systems, Inc. · 1997
- Illumination system particularly for EUV lithography111US 6,198,793 B1Carl-Zeiss-Stiftung trading as Carl Zeiss · 2001