G03F 7/70183
Zoom systems for adjusting beam diameter
Official title: {Zoom systems for adjusting beam diameter}
G03F7/70183 (Zoom systems for adjusting beam diameter) appears on 47 US grants and 45 published applications in this corpus.
Search patents in G03F- Granted patents
- 47
- Published applications
- 45
- Assignees
- 19
- Inventors
- 87
- Latest grant
- 14 Oct 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1989 | 1 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 1 | 0 |
| 1998 | 0 | 0 |
| 1999 | 1 | 0 |
| 2000 | 0 | 0 |
| 2001 | 3 | 0 |
| 2002 | 1 | 1 |
| 2003 | 3 | 10 |
| 2004 | 3 | 5 |
| 2005 | 3 | 6 |
| 2006 | 7 | 5 |
| 2007 | 3 | 5 |
| 2008 | 3 | 3 |
| 2009 | 5 | 2 |
| 2010 | 0 | 0 |
| 2011 | 0 | 1 |
| 2012 | 3 | 0 |
| 2013 | 2 | 0 |
| 2014 | 0 | 1 |
| 2015 | 0 | 1 |
| 2016 | 1 | 1 |
| 2017 | 0 | 0 |
| 2018 | 1 | 1 |
| 2019 | 2 | 0 |
| 2020 | 0 | 0 |
| 2021 | 0 | 0 |
| 2022 | 0 | 0 |
| 2023 | 0 | 1 |
| 2024 | 0 | 1 |
| 2025 | 1 | 1 |
By publication year. Applications have been published since 2001.
Recent patents
- Magnification adjustable projection system using movable lens plates14 Oct 2025US 12,443,017 B2Corning Incorporated
- Illumination system for EUV projection lithography4 Jun 2019US 10,310,381 B2Carl Zeiss SMT GmbH
- Beam delivery for EUV lithography14 May 2019US 10,289,006 B2ASML Netherlands B. V.
- Illumination system for EUV projection lithography1 May 2018US 9,958,783 B2Carl Zeiss SMT GmbH
- Lithographic apparatus, programmable patterning device and lithographic method10 May 2016US 9,335,638 B2ASML Netherlands B. V.
- Lens rebuilding system and method of rebuilding damaged lens in lithography tool16 Oct 2025US 2025/0321508 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Dynamic freeform optics for lithography illumination beam shaping14 Nov 2024US 2024/0377753 A1
- Magnification adjustable projection system using movable lens plates4 May 2023US 2023/0137707 A1Corning Incorporated
- Illumination system for euv projection lithography9 Aug 2018US 2018/0224750 A1Carl Zeiss SMT GmbH
- Illumination system for euv projection lithography1 Sep 2016US 2016/0252823 A1Carl Zeiss SMT GmbH
Most cited
By later US patents
- Illuminating arrangement including a zoom objective incorporating two axicons158US 5,675,401 ACarl-Zeiss-Stiftung · 1997
- Illuminating optical system and exposure apparatus utilizing the same93US 5,237,367 ANikon Corporation · 1993
- Method and apparatus for illuminating a surface using a projection imaging apparatus65US 6,563,567 B1Nikon Corporation · 2003
- Optical beam transformation system and illumination system comprising an optical beam transformation system57US 7,511,886 B2Carl Zeiss SMT GmbH · 2009
- Illumination optical system54US 4,851,882 ACanon Kabushiki Kaisha · 1989