Illumination system for euv projection lithography
AssigneeCarl Zeiss SMT GmbH
InventorsMichael Patra, Ralf Mueller
Life of this patent
Estimating the term…
Abstract
An illumination system for EUV projection lithography has a beam shaping optical unit for generating an EUV collective output beam from an EUV raw beam of a synchrotron-radiation-based light source. An output coupling optical unit serves for generating a plurality of EUV individual output beams from the EUV collective output beam. In each case a beam guiding optical unit serves for guiding the respective EUV individual output beam toward an object field in which a lithography mask is arrangable. The result is an illumination system with which EUV light of a synchrotron-radiation-based light source is guided to the greatest possible extent without losses and at the same time flexibly.
Claims22
-5. (canceled)
A beam shaping optical unit, comprising:
- at least two groups of mirrors on which EUV radiation impinges with grazing incidence during use of the beam shaping optical unit,
- wherein each mirror group has a common group incidence plane, the group incidence planes of the mirror groups differ from one another, and the beam shaping unit is an EUV lithography beam shaping unit.
-20. (canceled)
Dependencies are inferred from the claim text.