ASML US, Inc.
ASML US, Inc. is named on 0 US grants and 26 published applications in this corpus. Its most frequent classification is G03F (Photomechanical production of textured or patterned surfaces).
- Granted patents
- 0
- Published applications
- 26
- Inventors
- 43
- Granted in 2026 so far
- 0
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2002 | 0 | 4 |
| 2003 | 0 | 11 |
| 2004 | 0 | 10 |
| 2005 | 0 | 1 |
By publication year.
Technology areas
Share of 26 documents
- G03FPhotomechanical production of textured or patterned surfaces20
- G02BOptical elements, systems or apparatus7
- H10PGeneric processes or apparatus for the manufacture or treatment of devices covered2
- B24BMachines, devices, or processes for grinding or polishing1
- C23CCoating metallic material1
- D21HPulp compositions1
- F28FDetails of heat-exchange and heat-transfer apparatus, of general application1
- G01NInvestigating or analysing materials by determining their chemical or physical properties1
- G05DSystems for controlling or regulating non-electric variables1
- H04NPictorial communication1
Recent patents
No granted patents yet.
- Method and systems for improving focus accuracy in a lithography system16 Jun 2005US 2005/0128456 A1
- Optical cube16 Sep 2004US 2004/0179260 A1
- Method and apparatus for isolating light source gas from main chamber gas in a lithography tool27 May 2004US 2004/0099816 A1
- Method, system, and computer program product for improved trajectory planning and execution20 May 2004US 2004/0098160 A1
- Method and apparatus for cooling a reticle during lithographic exposure29 Apr 2004US 2004/0079518 A1
Most cited
By later US patents
None of its patents has been cited by a later US patent yet.