Lithographic apparatus, programmable patterning device and lithographic method
AssigneeASML Netherlands B.V.
InventorsPieter Willem Herman De Jager, Vadim Yevgenyevich Banine, Jozef Petrus Henricus Benschop, Cheng-Qun Gui, Johannes Onvlee, Erwin John Van Zwet
Life of this patent
Estimating the term…
Abstract
In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator may be moveable with respect the exposure area and/or the projection system may have an array of lenses to receive the plurality of beams, the array of lenses moveable with respect to the exposure area.
Claims24
A lithographic apparatus comprising:
- a substrate holder constructed to support a substrate;
- a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern;
- a projection system configured to project the modulated beams onto the substrate, the projection system comprising an array of lenses to receive the plurality of beams, the lenses arranged side by side and the projection system configured to move at least part of the array of lenses across an optical axis of the modulated beams;
- and
- a control system configured to cause the at least part of the array of lenses to move across the optical axis of the modulated beams, while radiation of at least one of the modulated beams passes through at least one of the lenses during exposure of the exposure area, to cause the at least one modulated beam to change positional orientation or displace.
A device manufacturing method comprising:
- providing a plurality of beams modulated according to a desired pattern;
- projecting the plurality of modulated beams onto a substrate using an array of lenses that receive the plurality of beams;
- and
- moving at least part of the array of lenses across an optical axis of the modulated beams, while radiation of at least one of the modulated beams passes through at least one of the lenses during exposure of the substrate, such that the at least one modulated beam has changed positional orientation or is displaced.
A lithographic apparatus comprising:
- a substrate holder constructed to support a substrate;
- a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern, the modulator comprising a plurality of individually controllable radiation sources, each radiation source configured to generate and emit electromagnetic radiation to form the plurality of radiation beams;
- and
- a projection system configured to project the modulated beams onto the substrate, the projection system comprising an array of lenses to receive the plurality of beams, the lenses arranged side by side and the projection system configured such that at least two of the beams pass through at least a single lens of the lenses.
Dependencies are inferred from the claim text.