Reticle stage
AssigneeASML Netherlands B.V.
InventorsMarcus Adrianus VAN DE KERKHOF, Krijn Frederik BUSTRAAN
Life of this patent
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Abstract
A reticle stage for a lithographic apparatus is disclosed. The reticle stage comprises a support for a reflective reticle, and at least one shielding element coupled to the support. The at least one shielding element is selectively configurable between a first position for shielding a portion of a patterned side of the reflective reticle from a radiation beam, and a second position for exposing the portion. An EUV lithography apparatus and a corresponding method of operating an EUV lithographic apparatus is also disclosed.
Claims16
-15. (canceled)
A reticle stage for a lithographic apparatus, the reticle stage comprising:
- a support for a reflective reticle;
- and
- at least one shielding element coupled to the support and selectively configurable between a first position for shielding a portion of a patterned side of the reflective reticle from a radiation beam, and a second position for exposing the portion.
A method of operating an EUV lithographic apparatus, the method comprising:
- determining a relative position and/or orientation of a reticle on a support of a reticle stage by sensing radiation reflected from at least one reticle alignment mark on a patterned side of the reflective reticle;
- configuring at least one shielding element coupled to the support to transition from a position for exposing the at least one reticle alignment mark to a position for shielding the at least one reticle alignment mark from an EUV radiation beam;
- and
- exposing the reflective reticle to EUV radiation, wherein radiation reflected from the reflective reticle is for patterning a substrate.
Dependencies are inferred from the claim text.