G03F 7/70175
Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle
Official title: {Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source}
G03F7/70175 (Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle) appears on 273 US grants and 324 published applications in this corpus.
Search patents in G03F- Granted patents
- 273
- Published applications
- 324
- Assignees
- 47
- Inventors
- 594
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 0 |
| 2002 | 0 | 5 |
| 2003 | 3 | 3 |
| 2004 | 3 | 9 |
| 2005 | 4 | 12 |
| 2006 | 9 | 18 |
| 2007 | 16 | 20 |
| 2008 | 22 | 12 |
| 2009 | 5 | 10 |
| 2010 | 13 | 17 |
| 2011 | 6 | 16 |
| 2012 | 9 | 5 |
| 2013 | 8 | 7 |
| 2014 | 8 | 9 |
| 2015 | 7 | 5 |
| 2016 | 12 | 11 |
| 2017 | 13 | 9 |
| 2018 | 7 | 7 |
| 2019 | 14 | 11 |
| 2020 | 19 | 34 |
| 2021 | 22 | 26 |
| 2022 | 18 | 18 |
| 2023 | 14 | 23 |
| 2024 | 10 | 16 |
| 2025 | 24 | 11 |
| 2026 | 3 | 10 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Prolonging optical element lifetime in an EUV lithography system22 Sep 2026US 12,743,021 B2ASML Netherlands B. V.
- Method for producing an optical element9 Jun 2026US 12,650,544 B2Carl Zeiss SMT GmbH
- Optical system for a lithographic projection exposure apparatus24 Mar 2026US 12,585,193 B2Carl Zeiss SMT GmbH
- EUV radiation source apparatus for lithography30 Dec 2025US 12,510,827 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Extreme ultraviolet light generation chamber device and electronic device manufacturing method23 Dec 2025US 12,504,694 B2Gigaphoton Inc.
- Extreme ultraviolet lithography system8 Oct 2026US 2026/0310108 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Debris trap unit and light source apparatus27 Aug 2026US 2026/0255465 A1Ushio Denki Kabushiki Kaisha
- Tunnel optic beam homogenizer for euv illumination systems13 Aug 2026US 2026/0235961 A1KLA Corporation
- Euv collector for use in an euv projection exposure apparatus9 Jul 2026US 2026/0194822 A2Carl Zeiss SMT GmbH
- Euv light generation apparatus and electronic device manufacturing method16 Apr 2026US 2026/0107367 A1Gigaphoton Inc.
Most cited
By later US patents
- Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source260US 7,196,342 B2Cymer, Inc. · 2007
- Extreme ultraviolet light source88US 6,972,421 B2Cymer, Inc. · 2005
- EUV light source80US 7,164,144 B2Cymer, Inc. · 2007
- Critical illumination condenser for x-ray lithography67US 5,737,137 AThe Regents of the University of California · 1998
- Monolithic silicon EUV collector54US 6,822,251 B1University of Central Florida Research Foundation, Inc. · 2004