Euv collector for use in an euv projection exposure apparatus
AssigneeCarl Zeiss SMT GmbH
InventorsDirk EHM, Wolfgang MERKEL
Life of this patent
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AssigneeCarl Zeiss SMT GmbH
InventorsDirk EHM, Wolfgang MERKEL
Estimating the term…
An EUV collector (24) serves for use in an EUV projection exposure apparatus for guiding EUV used light emanating from a source region of an EUV light source. The collector (24) has at least one reflection surface (30) that is curved to obtain a specified optical power. The collector (24) furthermore has at least one interchangeable reflection surface section (31i) and a holder (45) for holding the interchangeable reflection surface section (31i) in a collector recess (32) which is complementary to the interchangeable reflection surface section and is located in the EUV collector (24). The interchangeable reflection surface section (31i) is curved in accordance with the specified optical power. The outlay for testing collector materials and/or collector coating materials is reduced in the case of such an EUV collector.
An extreme-ultraviolet (EUV) collector for an EUV projection exposure apparatus and configured to guide EUV used light emanating from a source region of an EUV light source, comprising:
Dependencies are inferred from the claim text.