EUV light source
AssigneeCymer, Inc.
InventorsWilliam N. Partlo, Norbert Bowering, Alexander I. Ershov, Igor V. Fomenkov, David W. Myers, Ian Roger Oliver, John Viatella, Robert N. Jacques
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AssigneeCymer, Inc.
InventorsWilliam N. Partlo, Norbert Bowering, Alexander I. Ershov, Igor V. Fomenkov, David W. Myers, Ian Roger Oliver, John Viatella, Robert N. Jacques
Estimating the term…
A laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprises a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, and a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site.
A laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprising a target delivery system adapted to deliver plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, comprising:
A method of producing a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light comprising using a control system comprising a target delivery system delivering moving plasma formation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, comprising:
Dependencies are inferred from the claim text.