G03F 7/70166
Capillary or channel elements
Official title: {Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides}
G03F7/70166 (Capillary or channel elements) appears on 209 US grants and 226 published applications in this corpus.
Search patents in G03F- Granted patents
- 209
- Published applications
- 226
- Assignees
- 65
- Inventors
- 443
- Latest grant
- 14 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 1 | 0 |
| 1996 | 1 | 0 |
| 1997 | 1 | 0 |
| 1998 | 3 | 0 |
| 1999 | 1 | 0 |
| 2000 | 5 | 0 |
| 2001 | 3 | 0 |
| 2002 | 5 | 7 |
| 2003 | 12 | 10 |
| 2004 | 5 | 22 |
| 2005 | 13 | 16 |
| 2006 | 16 | 15 |
| 2007 | 13 | 15 |
| 2008 | 16 | 14 |
| 2009 | 10 | 7 |
| 2010 | 9 | 9 |
| 2011 | 5 | 10 |
| 2012 | 6 | 11 |
| 2013 | 6 | 4 |
| 2014 | 8 | 6 |
| 2015 | 2 | 2 |
| 2016 | 5 | 5 |
| 2017 | 2 | 2 |
| 2018 | 4 | 4 |
| 2019 | 7 | 7 |
| 2020 | 4 | 10 |
| 2021 | 10 | 11 |
| 2022 | 5 | 10 |
| 2023 | 5 | 11 |
| 2024 | 10 | 6 |
| 2025 | 6 | 6 |
| 2026 | 6 | 6 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Semiconductor system inspection tool and methods of operation14 Jul 2026US 12,684,679 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Extreme ultraviolet light generation system and electronic device manufacturing method30 Jun 2026US 12,669,752 B2Gigaphoton Inc.
- Optical lithography system and method of using the same5 May 2026US 12,619,157 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Pellicle, exposure original plate, exposure device, method of manufacturing pellicle, and method of manufacturing semiconductor device21 Apr 2026US 12,607,925 B2Mitsui Chemicals, Inc.
- Lithography system and methods10 Mar 2026US 12,572,080 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Extreme ultraviolet lithography system8 Oct 2026US 2026/0310108 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Semiconductor system inspection tool and methods of operation1 Oct 2026US 2026/0304585 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Reticle stage3 Sep 2026US 2026/0259509 A1ASML Netherlands B. V.
- Tunnel optic beam homogenizer for euv illumination systems13 Aug 2026US 2026/0235961 A1KLA Corporation
- Optical lithography system and method of using the same6 Aug 2026US 2026/0227703 A1Taiwan Semiconductor Manufacturing Company.Ltd
Most cited
By later US patents
- Illumination system particularly for EUV lithography111US 6,198,793 B1Carl-Zeiss-Stiftung trading as Carl Zeiss · 2001
- Use of a Kumakhov lens in analytic instruments99US 5,497,008 AX-Ray Optical Systems, Inc. · 1996
- Plasma focus high energy photon source93US 5,763,930 ACymer, Inc. · 1998
- Plasma focus high energy photon source91US 6,064,072 ACymer, Inc. · 2000
- Plasma focus light source with improved pulse power system89US 6,566,667 B1Cymer, Inc. · 2003