Plasma focus high energy photon source
AssigneeCymer, Inc.
InventorWilliam Norman Partlo
Life of this patent
Estimating the term…
Loading patent…
AssigneeCymer, Inc.
InventorWilliam Norman Partlo
Estimating the term…
A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. A working gas supply system supplies a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source for provides electrical pulses at a frequency of at least 100 Hz and a voltages high enough to create electrical discharge between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the active gas. An external reflection radiation collector-director collects radiation produced in the plasma pinches and directs the radiation in a desired direction. In a preferred embodiment the active gas is lithium and the buffer gas is helium and the radiation-collector is coated with the material used for the electrodes. That material is tungsten.
A high energy photon source comprising:
Dependencies are inferred from the claim text.