G03F 7/70125
Use of illumination settings tailored to particular mask patterns
Official title: {Use of illumination settings tailored to particular mask patterns (details of setting means G03F7/70091)}
G03F7/70125 (Use of illumination settings tailored to particular mask patterns) appears on 406 US grants and 364 published applications in this corpus.
Search patents in G03F- Granted patents
- 406
- Published applications
- 364
- Assignees
- 111
- Inventors
- 621
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1993 | 1 | 0 |
| 1994 | 4 | 0 |
| 1995 | 9 | 0 |
| 1996 | 7 | 0 |
| 1997 | 19 | 0 |
| 1998 | 12 | 0 |
| 1999 | 9 | 0 |
| 2000 | 7 | 0 |
| 2001 | 5 | 6 |
| 2002 | 14 | 13 |
| 2003 | 10 | 13 |
| 2004 | 8 | 20 |
| 2005 | 17 | 28 |
| 2006 | 23 | 32 |
| 2007 | 9 | 11 |
| 2008 | 20 | 16 |
| 2009 | 21 | 14 |
| 2010 | 12 | 13 |
| 2011 | 17 | 16 |
| 2012 | 7 | 23 |
| 2013 | 17 | 15 |
| 2014 | 29 | 12 |
| 2015 | 9 | 11 |
| 2016 | 10 | 13 |
| 2017 | 12 | 16 |
| 2018 | 16 | 12 |
| 2019 | 23 | 18 |
| 2020 | 9 | 6 |
| 2021 | 16 | 12 |
| 2022 | 12 | 11 |
| 2023 | 5 | 10 |
| 2024 | 3 | 8 |
| 2025 | 8 | 11 |
| 2026 | 6 | 4 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Methods of patterning a photoresist, and related patterning systems25 Aug 2026US 12,717,239 B2Liteq B.V.
- Methods of determining process models by machine learning25 Aug 2026US 12,717,243 B2ASML Netherlands B. V.
- Optimization of scanner throughput and imaging quality for a patterning process16 Jun 2026US 12,656,691 B2ASML Netherlands B. V.
- Light source optimization apparatus and light source optimization method19 May 2026US 12,632,706 B2Winbond Electronics Corp.
- Optimization method for mask pattern optical transfer14 Apr 2026US 12,601,977 B2United Microelectronics Corp.
- Optimization of scanner throughput and imaging quality for a patterning process24 Sep 2026US 2026/0288015 A1ASML Netherlands B. V.
- Structure and method for surface plasmon lithography imaging, and computer-readable medium17 Sep 2026US 2026/0277112 A1Institute of Microelectronics, Chinese Academy of Sciences
- Phase-shifting photomask16 Jul 2026US 2026/0202734 A1Powerchip Semiconductor Manufacturing Corporation
- Control apparatus and control method9 Apr 2026US 2026/0099097 A1Lasertec Corporation
- Method for training machine learning model to determine optical proximity correction for mask4 Dec 2025US 2025/0370327 A1ASML Netherlands B. V.
Most cited
By later US patents
- Projection exposure apparatus and method which uses multiple diffraction gratings in order to produce a solid state device with fine patterns855US 5,715,039 AHitachi, Ltd. · 1998
- Auxiliary mask features for enhancing the resolution of photolithography208US 5,636,002 ALucent Technologies Inc. · 1997
- Method and apparatus for generating masks utilized in conjunction with dipole illumination techniques192US 6,553,562 B2ASM Lithography B. V. · 2003
- Optical proximity correction method for intermediate-pitch features using sub-resolution scattering bars on a mask162US 5,821,014 AMicroUnity Systems Engineering, Inc. · 1998
- Lithographic emhancement method and apparatus for randomly spaced structures135US 5,424,154 AIntel Corporation · 1995