Optimization of scanner throughput and imaging quality for a patterning process
AssigneeASML Netherlands B.V.
InventorsXingyue PENG, Duan-Fu Stephen HSU
Life of this patent
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Abstract
A method for source mask optimization to increase scanner throughput for a patterning process is described. The method includes computing a multi-variable cost function of design variables that are representative of characteristics of the patterning process. The design variables may include (a) an illumination variable that is characteristic of an illumination system, and (b) a design layout variable that is characteristic of a design layout. The multi-variable cost function may be a function of a throughput of the patterning process. The method further includes reconfiguring the characteristics of the patterning process by adjusting the design variables until a predefined termination condition is satisfied.
Claims21
-16. (canceled)
A non-transitory computer-readable medium having stored instructions that, when executed by a computer system, are configured to cause the computer system to at least:
- obtain a full-transmission dose, which is indicative of a dose received at a substrate through an open-frame mask and without any obscuration or apodization in an illumination system to provide the dose;
- and
- compute a throughput of a patterning process for imaging a portion of a design layout using a lithographic projection apparatus as a function of the full-transmission dose and one or more lithographic projection apparatus parameters.
A non-transitory computer-readable medium having stored instructions that, when executed by a computer system, are configured to cause the computer system to at least:
- obtain a physical dose indicative of an energy density received from an illumination system at a substrate through an open-frame mask accumulated through a specified exposure time;
- obtain a full-transmission dose indicative of a dose received at the substrate through the open-frame mask and without any obscuration or apodization in the illumination system, wherein the full-transmission dose is obtained as a function of the physical dose;
- and
- compute a throughput of a patterning process for imaging a portion of a design layout using a lithographic projection apparatus as a function of the full-transmission dose and one or more lithographic projection apparatus parameters.
A non-transitory computer-readable medium having stored instructions that, when executed by a computer system, are configured to cause the computer system to at least:
- compute a multi-variable cost function of a plurality of design variables that are representative of characteristics of a patterning process for imaging a portion of a design layout using a lithographic projection apparatus having an illumination system and projection optics, wherein the design variables include (a) an illumination variable that is characteristic of the illumination system, and (b) a design layout variable that is characteristic of the design layout, wherein the multi-variable cost function is a function of a throughput of the patterning process;
- and
- reconfigure one or more characteristics of the patterning process by adjustment of the design variables until a predefined termination condition is satisfied.
Dependencies are inferred from the claim text.