Structure and method for surface plasmon lithography imaging, and computer-readable medium

Abstract

A structure and method for surface plasmon lithography imaging, and a computer-readable medium are provided. The structure includes: a reflective layer, a photoresist layer, a first resonant cavity structure and a mask layer. The reflective layer is arranged at a side of a to-be-etched structure. The photoresist layer is arranged at a side of the reflective layer away from the to-be-etched structure. The first resonant cavity structure is arranged at a side of the photoresist layer away from the to-be-etched structure. The mask layer is arranged at a side of the first resonant cavity structure away from the to-be-etched structure. By arranging the first resonant cavity structure between the mask layer and the photoresist layer in the structure for surface plasmon lithography imaging, a localization effect of the optical field is enhanced, thereby further breaking the diffraction limit, optimizing imaging performance, and improving resolution.

Dependencies are inferred from the claim text.