G03F 7/70083
Non-homogeneous intensity distribution in the mask plane
Official title: {Non-homogeneous intensity distribution in the mask plane}
G03F7/70083 (Non-homogeneous intensity distribution in the mask plane) appears on 153 US grants and 176 published applications in this corpus.
Search patents in G03F- Granted patents
- 153
- Published applications
- 176
- Assignees
- 47
- Inventors
- 239
- Latest grant
- 24 Jun 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1998 | 1 | 0 |
| 1999 | 2 | 0 |
| 2000 | 0 | 0 |
| 2001 | 2 | 0 |
| 2002 | 3 | 8 |
| 2003 | 6 | 10 |
| 2004 | 6 | 15 |
| 2005 | 8 | 5 |
| 2006 | 10 | 14 |
| 2007 | 8 | 12 |
| 2008 | 11 | 14 |
| 2009 | 6 | 20 |
| 2010 | 6 | 7 |
| 2011 | 8 | 10 |
| 2012 | 4 | 7 |
| 2013 | 10 | 5 |
| 2014 | 6 | 6 |
| 2015 | 10 | 12 |
| 2016 | 10 | 6 |
| 2017 | 12 | 4 |
| 2018 | 10 | 6 |
| 2019 | 4 | 3 |
| 2020 | 4 | 5 |
| 2021 | 1 | 1 |
| 2022 | 3 | 2 |
| 2023 | 1 | 0 |
| 2024 | 0 | 0 |
| 2025 | 1 | 4 |
By publication year. Applications have been published since 2001.
Recent patents
- Optimization using a non-uniform illumination intensity profile24 Jun 2025US 12,339,583 B2ASML Holding N. V.
- Lithographic apparatus and illumination uniformity correction system23 May 2023US 11,656,555 B2ASML Holding N. V.
- Method and apparatus for determining a radiation beam intensity profile7 Jun 2022US 11,353,796 B2ASML Netherlands B. V.
- Light source apparatus, illumination apparatus, exposure apparatus, and method for manufacturing object3 May 2022US 11,320,741 B2Canon Kabushiki Kaisha
- Exposure device, exposure method and photolithography method5 Apr 2022US 11,294,288 B2Boe Technology Group Co., Ltd.
- Method for manufacturing a micro-nanometric hierarchical structure and micro-nanometric hierarchical structure obtained by such a method16 Oct 2025US 2025/0321493 A1Commissariat A L' Energie Atomique Et Aux Energies Alternatives
- Optimization using a non-uniform illumination intensity profile2 Oct 2025US 2025/0306453 A1ASML Holding N. V.
- Method for operating a projection exposure system3 Jul 2025US 2025/0216792 A1
- Method for operating a microlithographic projection exposure apparatus, microlithographic mask and projection exposure apparatus10 Apr 2025US 2025/0116939 A1
- Optimization using a non-uniform illumination intensity profile8 Dec 2022US 2022/0390832 A1ASML Holding N. V.
Most cited
By later US patents
- Exposure apparatus and exposure method capable of controlling illumination distribution121US 6,771,350 B2Nikon Corporation · 2004
- Illumination system particularly for EUV lithography111US 6,198,793 B1Carl-Zeiss-Stiftung trading as Carl Zeiss · 2001
- Illumination system particularly for microlithography79US 6,438,199 B1Carl-Zeiss-Stiftung · 2002
- Illumination system and exposure apparatus and method74US 6,452,661 B1Nikon Corporation · 2002
- Exposure apparatus and exposure method capable of controlling illumination distribution61US 6,927,836 B2Nikon Corporation · 2005