Exposure apparatus and exposure method capable of controlling illumination distribution
AssigneeNikon Corporation
InventorHisashi Nishinaga
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AssigneeNikon Corporation
InventorHisashi Nishinaga
Estimating the term…
An exposure apparatus which expose a photosensitive layer on an object with light via a mask having a pattern to be transferred onto the photosensitive layer, includes an illumination optical system having plural optical elements provided along an optical axis substantially perpendicular to a plane on which the pattern is placed, and which include an optical integrator from which the mask is illuminated with the light through a part of the plural optical elements. The apparatus also includes a filter device having a rotatable filter element provided between the optical integrator and the plane, and having a transmittance distribution in a predetermined area. Light from the optical integrator passes through a portion in the predetermined area. Light from the filter element has a variable intensity distribution different from that of the light incident on the filter element from the optical integrator, and made variable by rotating the filter element.
An exposure apparatus which exposes a photosensitive layer on an object with a light via a mask having a pattern, to transfer the pattern onto the photosensitive layer, comprising:
An exposure apparatus which exposes a photosensitive layer on an object with a light via a mask having a pattern to be transferred onto the photosensitive layer, comprising:
An illumination apparatus provided in an exposure apparatus which exposes a photosensitive layer on an object with a light via a mask having a pattern to be transferred onto the photosensitive layer, comprising:
Dependencies are inferred from the claim text.