G03F 7/702
Reflective illumination, i.e. reflective optical elements other than folding mirrors
Official title: {Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems}
G03F7/702 (Reflective illumination, i.e. reflective optical elements other than folding mirrors) appears on 617 US grants and 657 published applications in this corpus.
Search patents in G03F- Granted patents
- 617
- Published applications
- 657
- Assignees
- 105
- Inventors
- 947
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 1 | 0 |
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 2 | 0 |
| 1987 | 2 | 0 |
| 1988 | 1 | 0 |
| 1989 | 3 | 0 |
| 1990 | 0 | 0 |
| 1991 | 3 | 0 |
| 1992 | 8 | 0 |
| 1993 | 4 | 0 |
| 1994 | 9 | 0 |
| 1995 | 8 | 0 |
| 1996 | 8 | 0 |
| 1997 | 8 | 0 |
| 1998 | 6 | 0 |
| 1999 | 9 | 0 |
| 2000 | 5 | 0 |
| 2001 | 12 | 1 |
| 2002 | 8 | 11 |
| 2003 | 12 | 23 |
| 2004 | 20 | 20 |
| 2005 | 13 | 17 |
| 2006 | 19 | 15 |
| 2007 | 11 | 16 |
| 2008 | 15 | 24 |
| 2009 | 8 | 22 |
| 2010 | 8 | 19 |
| 2011 | 12 | 23 |
| 2012 | 8 | 18 |
| 2013 | 9 | 23 |
| 2014 | 23 | 40 |
| 2015 | 28 | 48 |
| 2016 | 48 | 59 |
| 2017 | 60 | 40 |
| 2018 | 56 | 29 |
| 2019 | 43 | 20 |
| 2020 | 22 | 37 |
| 2021 | 34 | 19 |
| 2022 | 18 | 14 |
| 2023 | 10 | 18 |
| 2024 | 12 | 31 |
| 2025 | 9 | 42 |
| 2026 | 19 | 28 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Mirror, optical system and method for operating an optical system6 Oct 2026US 12,754,483 B2Carl Zeiss SMT GmbH
- Optical system and method for a radiation source6 Oct 2026US 12,757,311 B2ASML Netherlands B. V.
- Microelectromechanical apparatus with heating element18 Aug 2026US 12,710,619 B2Carl Zeiss SMT GmbH
- Method for depositing a cover layer, EUV lithography system and optical element4 Aug 2026US 12,699,330 B2Carl Zeiss SMT GmbH
- Diffraction-based illumination sampling28 Jul 2026US 12,693,155 B2KLA Corporation
- Lithography apparatus and method for operating the same24 Sep 2026US 2026/0288022 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Lithographic apparatus and associated methods10 Sep 2026US 2026/0267234 A1ASML Netherlands B. V.
- Optical element and euv lithography system3 Sep 2026US 2026/0259504 A1Carl Zeiss SMT GmbH
- Modulation of X-Ray Beam Intensity27 Aug 2026US 2026/0251980 A1LumArray, Inc.
- Tunnel optic beam homogenizer for euv illumination systems13 Aug 2026US 2026/0235961 A1KLA Corporation
Most cited
By later US patents
- Illumination system particularly for EUV lithography111US 6,198,793 B1Carl-Zeiss-Stiftung trading as Carl Zeiss · 2001
- Exposure device, exposure method and method of manufacturing semiconductor device103US 7,022,556 B1Semiconductor Energy Laboratory Co.Ltd. · 2006
- Illuminating arrangement for a projection microlithographic apparatus97US 6,285,443 B1Carl-Zeiss-Stiftung · 2001
- Illuminating device for providing an illumination beam with adjustable distribution of intensity and a pattern-transfer system comprising such a device93US 4,370,026 AThomson-CSF · 1983
- Device fabrication entailing plasma-derived x-ray delineation84US 5,339,346 AAT&T Bell Laboratories · 1994