G03F 7/70066
Size and form of the illuminated area in the mask plane
Official title: {Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds}
G03F7/70066 (Size and form of the illuminated area in the mask plane) appears on 383 US grants and 311 published applications in this corpus.
Search patents in G03F- Granted patents
- 383
- Published applications
- 311
- Assignees
- 103
- Inventors
- 683
- Latest grant
- 21 Apr 2026
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| Year | Granted patents | Published applications |
|---|---|---|
| 1981 | 1 | 0 |
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| 1986 | 3 | 0 |
| 1987 | 2 | 0 |
| 1988 | 5 | 0 |
| 1989 | 1 | 0 |
| 1990 | 2 | 0 |
| 1991 | 1 | 0 |
| 1992 | 4 | 0 |
| 1993 | 3 | 0 |
| 1994 | 5 | 0 |
| 1995 | 6 | 0 |
| 1996 | 6 | 0 |
| 1997 | 12 | 0 |
| 1998 | 12 | 0 |
| 1999 | 8 | 0 |
| 2000 | 11 | 0 |
| 2001 | 30 | 14 |
| 2002 | 26 | 30 |
| 2003 | 28 | 19 |
| 2004 | 21 | 25 |
| 2005 | 15 | 21 |
| 2006 | 16 | 16 |
| 2007 | 10 | 19 |
| 2008 | 16 | 15 |
| 2009 | 12 | 19 |
| 2010 | 4 | 7 |
| 2011 | 14 | 12 |
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| 2017 | 7 | 7 |
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| 2020 | 10 | 9 |
| 2021 | 5 | 8 |
| 2022 | 8 | 8 |
| 2023 | 5 | 3 |
| 2024 | 4 | 5 |
| 2025 | 3 | 13 |
| 2026 | 1 | 7 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
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- Abnormality detection apparatus, abnormality detection method, storage medium, shutter apparatus, exposure apparatus, and method for manufacturing article26 Nov 2024US 12,155,938 B2Canon Kabushiki Kaisha
- Lithography tool and method thereof1 Oct 2026US 2026/0299443 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Lithographic apparatus and associated methods10 Sep 2026US 2026/0267234 A1ASML Netherlands B. V.
- Reticle stage3 Sep 2026US 2026/0259509 A1ASML Netherlands B. V.
- Lithographic apparatus and device manufacturing method23 Jul 2026US 2026/0211341 A1ASML Netherlands B. V.
- Masking device and controlling method thereof9 Jul 2026US 2026/0194820 A1ASML Netherlands B. V.
Most cited
By later US patents
- Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus256US 6,795,169 B2Nikon Corporation · 2004
- Exposure method and projection exposure apparatus222US 5,194,893 ANikon Corporation · 1993
- Illuminating arrangement including a zoom objective incorporating two axicons158US 5,675,401 ACarl-Zeiss-Stiftung · 1997
- High resolution imagery systems and methods146US 4,936,665 A1990
- Scanning exposure method and apparatus133US 5,591,958 ANikon Corporation · 1997