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US 2026/0211341 A1Published application
Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsManis CHAUDHURI, Christian Gerardus Norbertus Hendricus Marie CLOIN, Andrei Mikhailovich YAKUNIN, Marcus Adrianus VAN DE KERKHOF
Life of this patent
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Abstract
A lithographic apparatus including: an illumination system for providing a beam of EUV radiation along a beam path; a holder for a patterning device configured to impart a pattern to the beam of radiation, the patterning device comprising a patterning surface with a pattern thereon; and an electron beam source configured to emit electrons toward the patterning surface and/or a part of the beam path adjacent the patterning surface.
Claims20
A lithographic apparatus comprising:
- an illumination system configured to provide a beam of EUV radiation along a beam path;
- a holder for a patterning device configured to impart a pattern to the beam of radiation, the patterning device comprising a patterning surface with a pattern thereon;
- and
- an electron beam source configured to emit electrons toward the patterning surface and/or a part of the beam path adjacent the patterning surface, the electron beam source configured to emit electrons having kinetic energy less than 10 eV.
1 more element
A device manufacturing method comprising:
- directing a beam of EUV radiation along a beam path to a patterning surface of a patterning device;
- and
- emitting electrons toward the patterning surface and/or a part of the beam path adjacent the patterning surface, wherein the electrons have kinetic energy less than 10 eV
Dependencies are inferred from the claim text.