Masking device and controlling method thereof
AssigneeASML Netherlands B.V.
InventorsEdwin DE JONG, Frank` EVERTS
Life of this patent
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Abstract
A method for controlling an exposure dose at a substrate utilizing a masking device, which device includes a first blade and a second blade. The method includes providing radiation pulses at the masking device for exposing the substrate, exposing an exposure area at the substrate by moving the first blade in a first direction relative to a slit center and by moving the second blade in a second direction, with the second direction being opposite to the first direction, and keeping an amount of radiation received at the exposure area constant, wherein moving the first and second blade is defined by a velocity profile of a substrate support supporting the substrate.
Claims20
A method for controlling an exposure dose at a substrate utilizing a masking device, comprising a first blade and a second blade, the method comprising:
- providing radiation pulses at the masking device for exposing the substrate;
- exposing an exposure area at the substrate by moving the first blade in a first direction relative to a slit center and by moving the second blade in a second direction, the second direction being opposite to the first direction;
- and
- keeping an amount of radiation received at the exposure area constant,
- wherein moving the first and second blade is defined by a velocity profile of a substrate support supporting the substrate.
A masking device for selectively shielding parts of a patterning device from a radiation beam, the masking device comprising:
- a plurality of masking blades, each being mechanically uncoupled with respect to one another;
- and
- a control unit arranged to control a position of each of the plurality of masking blades,
- wherein the position of at least two of the plurality of masing blades is defined by a velocity profile of a substrate support, the velocity profile being provided to the control unit.
A method for adjusting masking blade positions of a masking device, the method comprising:
- receiving a first input at a control unit, the first input comprising information of a velocity profile of a mask support and/or substrate support to be used during an exposure of a substrate;
- receiving a second input at the control unit, the second input being an exposure control metric;
- determining position set-points of masking blades during the exposure based on the first input and the second input;
- and
- adjusting masking blade positions by moving the masking blades to the determined position set-points.
Dependencies are inferred from the claim text.