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US 2026/0299443 A1Published application
Lithography tool and method thereof
AssigneesTsmc China Company Limited, Taiwan Semiconductor Manufacturing Company, Ltd.
InventorsFeihu WANG, Jie LIU, Lei WANG
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Abstract
A method includes fixing a supporting bracket to a working table in a lithography tool; placing a lifting device on the supporting bracket; lifting an optical element in lithography tool, using the lifting device, from a first level to a second level higher than the first level; rotating the optical element through a shaft connected with the optical element; and repairing the optical element.
Claims20
A method, comprising:
- fixing a supporting bracket to a working table in a lithography tool;
- placing a lifting device on the supporting bracket;
- lifting an optical element in lithography tool, using the lifting device, from a first level to a second level higher than the first level;
- rotating the optical element through a shaft connected with the optical element;
- and
- repairing the optical element.
3 more elements
A lithography tool, comprising:
- a working table;
- an optical element over the working table;
- a shaft connected with the optical element, wherein the shaft is rotatable;
- and
- a rotation assisting tool fixed on the working table, wherein the rotation assisting tool comprises a wheel in contact with a bottom surface of a portion of the shaft.
2 more elements
A lithography tool, comprising:
- a working table;
- a supporting bracket connected to the working table;
- an optical element over the working table;
- and
- a lifting device disposed on the working table and the supporting bracket, wherein the lifting device is configured to lifting the optical element from a first level to a second level higher than the first level.
2 more elements
Dependencies are inferred from the claim text.