Lithographic apparatus and method for illumination uniformity correction
AssigneeASML Netherlands B.V.
InventorsNikolaos Sotiropoulos, Albertus Hartgers, Michael Frederik Ypma, Marco Matheus Louis Steeghs
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Abstract
A lithographic apparatus comprising an illumination system configured to condition a radiation beam and a uniformity correction system configured to adjust an intensity profile of the radiation beam. The lithographic apparatus comprises a control system configured to control the uniformity correction system at least partially based on a thermal status criterion that is indicative of a thermal state of a part of the lithographic apparatus.
Claims13
A lithographic apparatus comprising:
- an illumination system configured to condition a radiation beam;
- a uniformity correction system configured to adjust an intensity profile of the radiation beam;
- a control system configured to control the uniformity correction system at least partially based on a thermal status criterion that is indicative of a thermal state of a part of the lithographic apparatus;
- a measurement system configured to measure a thermal deformation of the part of the lithographic apparatus, wherein the thermal status criterion comprises a monitored component and wherein the monitored component comprises a measurement performed by the measurement system;
- a sensing system configured to measure a temperature of the part of the lithographic apparatus, wherein the thermal status criterion comprises a monitored component and wherein the monitored component comprises a measurement performed by the sensing system;
- and
- a cooling system configured to provide a flow of coolant configured to cool the part of the lithographic apparatus, wherein the sensing system is configured to measure a temperature of the coolant.
A method of controlling a radiation beam of a lithography apparatus, the method comprising:
- conditioning the radiation beam;
- adjusting an intensity profile of the radiation beam at least partially based on a thermal status criterion that is indicative of a thermal state of a part of the lithographic apparatus, wherein the thermal status criterion comprises a monitored component and wherein the monitored component comprises a thermal deformation measurement;
- measuring, using a sensing system, a temperature of the part of the lithographic apparatus, wherein the monitored component comprises a measurement performed by the sensing system;
- and
- providing, using a cooling system, a flow of coolant to cool the part of the lithographic apparatus, wherein the sensing system is further configured to measure a temperature of the coolant.
Dependencies are inferred from the claim text.