G03F 7/70133
Measurement of illumination distribution, in pupil plane or field plane
Official title: {Measurement of illumination distribution, in pupil plane or field plane}
G03F7/70133 (Measurement of illumination distribution, in pupil plane or field plane) appears on 208 US grants and 230 published applications in this corpus.
Search patents in G03F- Granted patents
- 208
- Published applications
- 230
- Assignees
- 47
- Inventors
- 460
- Latest grant
- 14 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 2 | 0 |
| 1998 | 3 | 0 |
| 1999 | 4 | 0 |
| 2000 | 2 | 0 |
| 2001 | 5 | 4 |
| 2002 | 4 | 5 |
| 2003 | 2 | 3 |
| 2004 | 4 | 10 |
| 2005 | 6 | 9 |
| 2006 | 7 | 7 |
| 2007 | 2 | 4 |
| 2008 | 5 | 9 |
| 2009 | 4 | 3 |
| 2010 | 7 | 9 |
| 2011 | 2 | 4 |
| 2012 | 3 | 7 |
| 2013 | 7 | 15 |
| 2014 | 8 | 11 |
| 2015 | 11 | 11 |
| 2016 | 12 | 12 |
| 2017 | 14 | 16 |
| 2018 | 19 | 16 |
| 2019 | 13 | 12 |
| 2020 | 18 | 13 |
| 2021 | 8 | 9 |
| 2022 | 9 | 9 |
| 2023 | 9 | 6 |
| 2024 | 5 | 11 |
| 2025 | 2 | 7 |
| 2026 | 5 | 8 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
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- Fast uniformity drift correction20 Jan 2026US 12,529,963 B2ASML Holding N. V.
- Optical system, in particular for characterizing a microlithography mask24 Sep 2026US 2026/0287914 A1Carl Zeiss SMT GmbH
- Illumination optical unit for projection lithography, and method for monitoring such an illumination optical unit30 Jul 2026US 2026/0219579 A1
- Illumination optical unit, and method for measuring a dependence of an intensity of illumination light, incident on an object field, on at least one detection object field coordinate using such an illumination optical unit30 Jul 2026US 2026/0219581 A1
- Method for determining an optical property30 Jul 2026US 2026/0219583 A1ASML Netherlands B. V.
- Overlay metrology system with direction-isolated imaging9 Jul 2026US 2026/0194823 A1KLA Corporation
Most cited
By later US patents
- Imaging method for manufacture of microdevices85US 5,305,054 ACanon Kabushiki Kaisha · 1994
- Lithographic apparatus and device manufacturing method74US 6,958,806 B2ASML Netherlands B. V. · 2005
- System for real-time monitoring the characteristics, variations and alignment errors of lithography structures52US 4,585,342 AInternational Business Machines Corporation · 1986
- Projection exposure apparatus40US 5,160,962 ACanon Kabushiki Kaisha · 1992
- Exposure apparatus and device manufacturing method39US 6,333,777 B1Canon Kabushiki Kaisha · 2001