EUV lithography system with 3D sensing and tunning modules

An extreme ultraviolet (EUV) lithography system, comprising:

• a radiation source;
• and
• an EUV control system integrated with the radiation source,
• wherein the EUV control system includes:
• a 3-dimensional diagnostic module (3DDM) designed to collect a 3-dimensional (3D) laser beam profile of a laser beam from the radiation source and 3D data of a plasma produced by the laser beam, and
• an EUV control module coupled with and designed to adjust the radiation source.

A method for an extreme ultraviolet (EUV) lithography system that includes a radiation source configured to generate an EUV radiation, comprising:

• collecting a laser beam profile of a laser beam from the radiation source in a 3-dimensional (3D) mode;
• performing an analysis to the laser beam profile, resulting in an analysis data;
• and
• adjusting the radiation source according to the analysis data to enhance the EUV radiation.