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US 12,681,320 B2Granted
Optical system, in particular for characterizing a microlithography mask
AssigneeCarl Zeiss SMT GmbH
InventorsUlrich Matejka, Sascha Perlitz, Johannes Ruoff
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Abstract
The invention relates to an optical system and, in particular for characterizing a microlithography mask, comprising a light source for generating light of a wavelength of less than 30 nm, an illumination beam path leading from the light source to an object plane, an imaging beam path leading from the object plane to an image plane and a beam splitter, via which both the illumination beam path and the imaging beam path run.
Claims20
An optical system comprising:
- a light source for generating light of a wavelength of less than 30 nm;
- an illumination beam path leading from the light source to an object plane, wherein there is at least one mirror in the illumination beam path between the light source and the object plane;
- an imaging beam path leading from the object plane to an image plane, wherein there is at least one mirror in the imaging beam path between the object plane and the image plane;
- and
- a beam splitter, via which both the illumination beam path and the imaging beam path of the light of the wavelength of less than 30 nm run;
- wherein the light in the illumination beam path is reflected at the beam splitter and light in the imaging beam path is transmitted through the beam splitter.
3 more elements
Dependencies are inferred from the claim text.