G03F 7/70191
Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation
Official title: {Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like}
G03F7/70191 (Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation) appears on 844 US grants and 927 published applications in this corpus.
Search patents in G03F- Granted patents
- 844
- Published applications
- 927
- Assignees
- 163
- Inventors
- 1,318
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 2 | 0 |
| 1994 | 2 | 0 |
| 1995 | 2 | 0 |
| 1996 | 3 | 0 |
| 1997 | 3 | 0 |
| 1998 | 4 | 0 |
| 1999 | 4 | 0 |
| 2000 | 5 | 0 |
| 2001 | 12 | 6 |
| 2002 | 8 | 5 |
| 2003 | 13 | 22 |
| 2004 | 13 | 15 |
| 2005 | 9 | 29 |
| 2006 | 16 | 35 |
| 2007 | 23 | 44 |
| 2008 | 20 | 35 |
| 2009 | 18 | 49 |
| 2010 | 15 | 35 |
| 2011 | 36 | 48 |
| 2012 | 23 | 35 |
| 2013 | 36 | 53 |
| 2014 | 43 | 55 |
| 2015 | 59 | 74 |
| 2016 | 75 | 58 |
| 2017 | 87 | 53 |
| 2018 | 73 | 51 |
| 2019 | 45 | 48 |
| 2020 | 57 | 43 |
| 2021 | 37 | 25 |
| 2022 | 21 | 27 |
| 2023 | 16 | 25 |
| 2024 | 25 | 33 |
| 2025 | 19 | 13 |
| 2026 | 16 | 11 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Field mirrors for imaging field compression driven photon efficiency and imaging wavefront improvement6 Oct 2026US 12,754,482 B2KLA Corporation
- Methods of patterning a photoresist, and related patterning systems25 Aug 2026US 12,717,239 B2Liteq B.V.
- Photomask and manufacturing method of semiconductor device4 Aug 2026US 12,699,313 B2Powerchip Semiconductor Manufacturing Corporation
- Exposure apparatus, exposure method, and manufacturing method for electronic device28 Jul 2026US 12,693,601 B2Nikon Corporation
- Extreme ultraviolet (EUV) radiation source apparatus, EUV lithography system, and method for generating extreme ultraviolet radiation2 Jun 2026US 12,645,148 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Optical system including optical filter and corresponding method1 Oct 2026US 2026/0299430 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Extreme ultraviolet (euv) radiation source apparatus, euv lithography system, and method for generating extreme ultraviolet radiation17 Sep 2026US 2026/0277110 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Optical lithography system and method of using the same6 Aug 2026US 2026/0227703 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Pattern exposure apparatus, device manufacturing method, and exposure apparatus9 Jul 2026US 2026/0194825 A1Nikon Corporation
- Exposure apparatus, exposure method, and flat panel display manufacturing method25 Jun 2026US 2026/0177926 A1Nikon Corporation
Most cited
By later US patents
- Extreme ultraviolet lithography process and mask331US 8,841,047 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2014
- Exposure apparatus and exposure method capable of controlling illumination distribution121US 6,771,350 B2Nikon Corporation · 2004
- Method of exposing a light sensitive material88US 5,539,568 ATexas Instruments Incorporated · 1996
- Filter for extreme ultraviolet lithography81US 6,359,969 B1Stichting voor de Technische Wetenschappen · 2002
- Exposure method and apparatus, and method for fabricating device63US 7,446,858 B2Nikon Corporation · 2008