Exposure apparatus, exposure method, and flat panel display manufacturing method

An exposure apparatus comprising:

• a first illumination optical system;
• a first spatial light modulator illuminated with light from the first illumination optical system;
• a first projection optical system that illuminates a target with light from the first spatial light modulator;
• a second illumination optical system;
• a second spatial light modulator illuminated with light from the second illumination optical system;
• a second projection optical system that illuminates the target with light from the second spatial light modulator;
• and
• a stage with a top surface configured to support the target, the stage being configured to move in a first direction,
• wherein the first illumination optical system includes:
• a first lens positioned lower than the first spatial light modulator;
• and
• a first optical component that guides light passed through the first lens to the first spatial light modulator,
• wherein the second illumination optical system includes:
• a second lens positioned lower than the second spatial light modulator;
• and
• a second optical component that guides light passed through the second lens to the second spatial light modulator,
• wherein the first illumination optical system and the second illumination optical system are arranged in a second direction intersecting with the first direction,
• wherein the first spatial light modulator and the second spatial light modulator are arranged in the second direction,
• wherein the first projection optical system and the second projection optical system are arranged in the second direction, and
• wherein, in a plan view, the first and second lenses and the first and second spatial light modulators are located at different positions with respect to the first direction.

An exposure apparatus comprising:

• a stage with a top surface configured to support a target, the stage being configured to move in a first direction;
• a plurality of first illumination optical systems arranged in a second direction intersecting with the first direction;
• a plurality of first spatial light modulators arranged in the second direction, the plurality of first spatial light modulators each illuminated with light from the corresponding first illumination optical systems;
• a plurality of first projection optical systems arranged in the second direction, the plurality of first projection optical systems each illuminating the target with light from the corresponding first spatial light modulators;
• a plurality of second illumination optical systems arranged in the second direction;
• a plurality of second spatial light modulators arranged in the second direction, the plurality of second spatial light modulators each illuminated with light from the corresponding second illumination optical systems;
• and
• a plurality of second projection optical systems arranged in the second direction, the plurality of second projection optical systems each illuminating the target with light from the corresponding second spatial light modulators,
• wherein the plurality of first illumination optical systems each include:
• a first lens positioned lower than the corresponding first spatial light modulators;
• and
• a first optical component that guides light passed through the first lens to the corresponding first spatial light modulators,
• wherein the plurality of second illumination optical systems each include:
• a second lens positioned lower than the corresponding second spatial light modulators;
• and
• a second optical component that guides light passed through the second lens to the corresponding second spatial light modulators, and
• wherein, in a plan view, the first and second lenses and the first and second spatial light modulators are located at different positions with respect to the first direction.