Filter for extreme ultraviolet lithography
AssigneeStichting voor de Technische Wetenschappen
InventorLeonid Shmaenok
Life of this patent
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Abstract
An apparatus, suited, for example, for extreme ultraviolet lithography, includes a radiation source and a processing organ for processing the radiation from the radiation source. Between the radiation source and the processing organ a filter is placed which, in the radial direction from the radiation source, comprises a plurality of foils or plates.
Claims12
An apparatus comprising a radiation source and a processing organ for processing radiation from the radiation source, wherein a filter for suppressing undesired atomic and microscopic particles is placed between the radiation source and the processing organ, which filter comprises a plurality of foils or plates having surfaces for trapping atomic and microscopic particles thereon, wherein each foil or plate essentially points in a radial direction when viewed from the radiation source.
A filter for suppressing undesired atomic and microscopic particles which are emitted by a radiation source, wherein a plurality of plates are positioned substantially parallel in relation to one another, for trapping atomic and microscopic particles on their respective surfaces, wherein the plates are directed radially from the radiation source.
Dependencies are inferred from the claim text.