Extreme ultraviolet (EUV) radiation source apparatus, EUV lithography system, and method for generating extreme ultraviolet radiation

An extreme ultraviolet (EUV) radiation source apparatus, comprising:

• a chamber;
• an EUV source configured to supply an EUV radiation having an EUV light path traveling along the chamber through an exit port;
• a first filter located in the EUV light path and configured to allow the EUV radiation to pass through;
• and
• a rotatable carrier on which the first filter is disposed, wherein the first filter is a debris filter, and the rotatable carrier is configured to rotate the first filter about a center of the first filter after a used portion of the first filter is contaminated by a fuel debris generated from the EUV source, and
• wherein the first filter includes a first membrane and a first mesh integrally formed with the first membrane.

A method for generating extreme ultraviolet (EUV) radiation, comprising:

• forming a first filter including a membrane and a mesh integrally formed with the membrane;
• disposing the first filter in a chamber adjacent to an EUV source vessel;
• collecting a first fuel debris on a first portion of the first filter in the chamber;
• rotating the first filter about a center of the first filter;
• and
• collecting a second fuel debris on a second portion, different from the first portion, of the first filter.