Exposure apparatus, exposure method, and manufacturing method for electronic device

An exposure method of exposing an exposure target using an exposure apparatus,

• wherein the exposure apparatus comprises:
• an illumination optical system;
• a first spatial light modulator which is illuminated by a first illumination light from the illumination optical system;
• a first projection optical system that irradiates an exposure target with light emitted from the first spatial light modulator;
• a second spatial light modulator into which a second illumination light enters;
• a second projection optical system into which the second illumination light emitted from the second spatial light modulator enters;
• a stage that moves the exposure target in a scanning direction with respect to the first projection optical system and the second projection optical system;
• and
• a controller that controls exposure for the exposure target,
• wherein the method comprises:
• a first step of performing a first exposure based on information of an arrangement or shape of an exposure pattern;
• and
• a second step of performing a second exposure based on at least a portion of the information, and
• wherein, in each of the first step and the second step, the following are performed in order:
• (1) moving the stage from one side to another side in the scanning direction so that (i) the first illumination light is projected onto a first region extending in the scanning direction in the exposure target and (ii) the second illumination light is projected onto a second region extending in the scanning direction in the exposure target;
• (2) moving the stage in a direction intersecting the scanning direction;
• and
• (3) moving the stage from the other side to the one side in the scanning direction so that (i) the first illumination light is projected onto a third region, which includes a region overlapping with the first region and a region other than the region overlapping with the first region, and (ii) the second illumination light is projected onto a fourth region, which includes a region overlapping with the second region and a region other than the region overlapping with the second region.

A method of controlling an exposure apparatus,

• wherein the exposure apparatus comprises:
• an exposure module system that includes a spatial light modulator forming a light intensity distribution and that irradiates a resist layer of a substrate with light emitted from the spatial light modulator;
• and
• a stage that moves the substrate in a scanning direction with respect to the exposure module system,
• wherein the method comprises:
• a first step of performing a first exposure of the resist layer based on information of an arrangement or shape of an exposure pattern;
• and
• a second step of performing a second exposure of the resist layer based on at least part of the information, after the first step is executed, and
• wherein each of the first step and the second step includes:
• moving, with respect to the spatial light modulator, the stage on which the substrate is mounted from a first side to a second side in the scanning direction so that the light from the exposure module system is projected onto a first region extending in the scanning direction in the resist layer;
• after moving, with respect to the first spatial light modulator, the stage on which the substrate is mounted from the first side to the second side, moving the stage on which the substrate is mounted in a direction intersecting the scanning direction;
• and
• after moving the stage on which the substrate is mounted in the direction intersecting the scanning direction, moving the stage on which the substrate is mounted from the second side to the first side in the scanning direction so that the light from the exposure module system is projected onto a second region, which includes a region overlapping with the first region and a region other than the region overlapping with the first region.