G03F 7/70141
Illumination system adjustment
Official title: {Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system}
G03F7/70141 (Illumination system adjustment) appears on 381 US grants and 435 published applications in this corpus.
Search patents in G03F- Granted patents
- 381
- Published applications
- 435
- Assignees
- 80
- Inventors
- 827
- Latest grant
- 1 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1987 | 1 | 0 |
| 1988 | 2 | 0 |
| 1989 | 1 | 0 |
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 3 | 0 |
| 1996 | 2 | 0 |
| 1997 | 2 | 0 |
| 1998 | 2 | 0 |
| 1999 | 2 | 0 |
| 2000 | 1 | 0 |
| 2001 | 9 | 1 |
| 2002 | 0 | 7 |
| 2003 | 6 | 14 |
| 2004 | 14 | 15 |
| 2005 | 9 | 12 |
| 2006 | 14 | 8 |
| 2007 | 5 | 10 |
| 2008 | 3 | 13 |
| 2009 | 6 | 16 |
| 2010 | 6 | 12 |
| 2011 | 9 | 18 |
| 2012 | 7 | 15 |
| 2013 | 18 | 30 |
| 2014 | 19 | 18 |
| 2015 | 19 | 31 |
| 2016 | 34 | 30 |
| 2017 | 40 | 25 |
| 2018 | 29 | 24 |
| 2019 | 30 | 31 |
| 2020 | 30 | 19 |
| 2021 | 12 | 14 |
| 2022 | 16 | 12 |
| 2023 | 9 | 7 |
| 2024 | 5 | 19 |
| 2025 | 6 | 19 |
| 2026 | 8 | 15 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Exposure apparatus and article manufacturing method1 Sep 2026US 12,724,351 B2Canon Kabushiki Kaisha
- Systems and methods for reducing pattern shift in a lithographic apparatus5 May 2026US 12,619,160 B2ASML Netherlands B. V.
- EUV light generation apparatus and electronic device manufacturing method17 Feb 2026US 12,554,202 B2Gigaphoton Inc.
- Illumination compensation method10 Feb 2026US 12,547,081 B2The Institute of Optics and Electronics, The Chinese Academy of Sciences
- Optical method and apparatus for quickly realizing precise calibration of lithography system3 Feb 2026US 12,541,154 B2Institute of Microelectronics, Chinese Academy of Sciences
- Optical system for a projection exposure apparatus, and method for specifying an illumination pupil13 Aug 2026US 2026/0235866 A1
- Tunnel optic beam homogenizer for euv illumination systems13 Aug 2026US 2026/0235961 A1KLA Corporation
- Measurement system, measurement method with the aid of such a measurement system, and projection exposure apparatus comprising such a measurement system6 Aug 2026US 2026/0227714 A1
- Measuring system for optically checking an alignment state, method for optically checking an alignment state, alignment method30 Jul 2026US 2026/0219036 A1
- Optical system9 Jul 2026US 2026/0194821 A1ASML Netherlands B. V.
Most cited
By later US patents
- Method and system for selective linewidth optimization during a lithographic process204US 6,509,952 B1Silicon Valley Group, Inc. · 2003
- Lithographic apparatus and device manufacturing method161US 7,213,963 B2ASML Netherlands B. V. · 2007
- Illumination system and exposure apparatus having the same154US 6,259,512 B1Canon Kabushiki Kaisha · 2001
- Projection exposure method and apparatus100US 6,211,944 B1Nikon Corporation · 2001
- Illuminating arrangement for a projection microlithographic apparatus97US 6,285,443 B1Carl-Zeiss-Stiftung · 2001