Exposure apparatus and article manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorShohei Iwata
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AssigneeCanon Kabushiki Kaisha
InventorShohei Iwata
Estimating the term…
An exposure apparatus for exposing a plurality of shot regions on a substrate includes a projection optical system, a drive mechanism configured to drive the substrate, a detector configured to detect a surface height of the substrate, and a controller configured to control the drive mechanism based on an output of the detector. The projection optical system is configured to project a pattern of an original to an exposure region in an image plane of the projection optical system. A detection region of the detector is larger than the exposure region. The controller is configured to control, based on an output of the detector obtained when a first shot region of the plurality of shot regions is arranged in the exposure region, driving of the substrate, by the drive mechanism, for exposing a second shot region of the plurality of shot regions.
An exposure apparatus for exposing a plurality of shot regions on a substrate, comprising:
An article manufacturing method comprising:
Dependencies are inferred from the claim text.