G03F 7/70691
Handling of masks or workpieces
Official title: {Handling of masks or workpieces}
G03F7/70691 (Handling of masks or workpieces) appears on 5,393 US grants and 5,277 published applications in this corpus.
Search patents in G03F- Granted patents
- 5,393
- Published applications
- 5,277
- Assignees
- 691
- Inventors
- 6,865
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 7 | 0 |
| 1977 | 4 | 0 |
| 1978 | 5 | 0 |
| 1979 | 4 | 0 |
| 1980 | 6 | 0 |
| 1981 | 7 | 0 |
| 1982 | 6 | 0 |
| 1983 | 13 | 0 |
| 1984 | 12 | 0 |
| 1985 | 30 | 0 |
| 1986 | 17 | 0 |
| 1987 | 25 | 0 |
| 1988 | 25 | 0 |
| 1989 | 25 | 0 |
| 1990 | 25 | 0 |
| 1991 | 28 | 0 |
| 1992 | 40 | 0 |
| 1993 | 34 | 0 |
| 1994 | 29 | 0 |
| 1995 | 38 | 0 |
| 1996 | 59 | 0 |
| 1997 | 67 | 0 |
| 1998 | 109 | 0 |
| 1999 | 92 | 0 |
| 2000 | 109 | 0 |
| 2001 | 148 | 73 |
| 2002 | 148 | 182 |
| 2003 | 153 | 200 |
| 2004 | 182 | 237 |
| 2005 | 194 | 335 |
| 2006 | 217 | 309 |
| 2007 | 203 | 297 |
| 2008 | 203 | 288 |
| 2009 | 168 | 278 |
| 2010 | 162 | 216 |
| 2011 | 163 | 194 |
| 2012 | 165 | 169 |
| 2013 | 182 | 177 |
| 2014 | 207 | 148 |
| 2015 | 191 | 204 |
| 2016 | 220 | 165 |
| 2017 | 208 | 188 |
| 2018 | 221 | 228 |
| 2019 | 247 | 209 |
| 2020 | 184 | 208 |
| 2021 | 168 | 169 |
| 2022 | 140 | 167 |
| 2023 | 142 | 160 |
| 2024 | 114 | 189 |
| 2025 | 126 | 145 |
| 2026 | 121 | 142 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Apparatus for treating substrate and method for treating a substrate6 Oct 2026US 12,754,475 B2Semes Co., Ltd.
- UV lithography system and method6 Oct 2026US 12,754,480 B2The Regents of the University of California
- Screw transmission drive, and reticle stage and measuring device for semiconductor lithography applications6 Oct 2026US 12,754,486 B2Carl Zeiss SMT GmbH
- Storage and transfer module and substrate treatment apparatus including storage and transfer module29 Sep 2026US 12,748,355 B2Semes Co., Ltd.
- Substrate processing apparatus and substrate processing method29 Sep 2026US 12,751,246 B2Tokyo Electron Limited
- Optical apparatus, exposure apparatus and exposure method8 Oct 2026US 2026/0310089 A1SCREEN Holdings Co., Ltd.
- Semiconductor devices and methods of formation8 Oct 2026US 2026/0310095 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Methods and apparatuses for obtaining a calibration for a substrate topography measurement and methods and apparatuses for determining a topography of a substrate using the calibration8 Oct 2026US 2026/0310100 A1ASML Netherlands B. V.
- Precise, High Throughput Optical Imaging Of Packaged Devices8 Oct 2026US 2026/0310105 A1
- Workpiece support8 Oct 2026US 2026/0310106 A1Taiwan Semiconductor Manufacturing Company.Ltd
Most cited
By later US patents
- Immersion type projection exposure apparatus1,116US 5,610,683 ACanon Kabushiki Kaisha · 1997
- Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus1,042US 5,825,043 ANikon Precision Inc. · 1998
- Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device918US 5,969,441 AASM Lithography B. V. · 1999
- Lithographic apparatus and device manufacturing method764US 6,952,253 B2ASML Netherlands B. V. · 2005
- Projection exposure apparatus having an off-axis alignment system and method of alignment therefor744US 5,243,195 ANikon Corporation · 1993