G03F 7/70716
Stages
Official title: {Stages}
G03F7/70716 (Stages) appears on 2,079 US grants and 2,026 published applications in this corpus.
Search patents in G03F- Granted patents
- 2,079
- Published applications
- 2,026
- Assignees
- 286
- Inventors
- 2,739
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 4 | 0 |
| 1977 | 0 | 0 |
| 1978 | 1 | 0 |
| 1979 | 2 | 0 |
| 1980 | 4 | 0 |
| 1981 | 1 | 0 |
| 1982 | 3 | 0 |
| 1983 | 2 | 0 |
| 1984 | 7 | 0 |
| 1985 | 7 | 0 |
| 1986 | 5 | 0 |
| 1987 | 11 | 0 |
| 1988 | 8 | 0 |
| 1989 | 5 | 0 |
| 1990 | 12 | 0 |
| 1991 | 14 | 0 |
| 1992 | 13 | 0 |
| 1993 | 9 | 0 |
| 1994 | 7 | 0 |
| 1995 | 9 | 0 |
| 1996 | 19 | 0 |
| 1997 | 25 | 0 |
| 1998 | 45 | 0 |
| 1999 | 41 | 0 |
| 2000 | 50 | 0 |
| 2001 | 68 | 33 |
| 2002 | 66 | 65 |
| 2003 | 63 | 86 |
| 2004 | 70 | 82 |
| 2005 | 76 | 105 |
| 2006 | 82 | 121 |
| 2007 | 64 | 88 |
| 2008 | 68 | 105 |
| 2009 | 45 | 83 |
| 2010 | 51 | 82 |
| 2011 | 57 | 69 |
| 2012 | 46 | 64 |
| 2013 | 71 | 75 |
| 2014 | 73 | 55 |
| 2015 | 70 | 91 |
| 2016 | 103 | 71 |
| 2017 | 107 | 89 |
| 2018 | 97 | 107 |
| 2019 | 117 | 85 |
| 2020 | 77 | 91 |
| 2021 | 71 | 59 |
| 2022 | 49 | 61 |
| 2023 | 49 | 58 |
| 2024 | 41 | 68 |
| 2025 | 45 | 65 |
| 2026 | 49 | 68 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- UV lithography system and method6 Oct 2026US 12,754,480 B2The Regents of the University of California
- Screw transmission drive, and reticle stage and measuring device for semiconductor lithography applications6 Oct 2026US 12,754,486 B2Carl Zeiss SMT GmbH
- Substrate processing apparatus and substrate processing method29 Sep 2026US 12,751,246 B2Tokyo Electron Limited
- Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method15 Sep 2026US 12,736,887 B2ASML Netherlands B. V.
- Management apparatus, lithography apparatus. management method, and article manufacturing method15 Sep 2026US 12,736,928 B2Canon Kabushiki Kaisha
- Optical apparatus, exposure apparatus and exposure method8 Oct 2026US 2026/0310089 A1SCREEN Holdings Co., Ltd.
- Precise, High Throughput Optical Imaging Of Packaged Devices8 Oct 2026US 2026/0310105 A1
- Workpiece support8 Oct 2026US 2026/0310106 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Substrate warpage determination system8 Oct 2026US 2026/0310107 A1ASML Netherlands B. V.
- A positioning system for positioning an object within an xyz-system of coordinates1 Oct 2026US 2026/0295859 A1Vdl Enabling Technologies Group B.V.
Most cited
By later US patents
- Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus1,042US 5,825,043 ANikon Precision Inc. · 1998
- Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device918US 5,969,441 AASM Lithography B. V. · 1999
- Projection exposure apparatus and method with workpiece area detection611US 6,191,429 B1Nikon Precision Inc. · 2001
- Stage device with frame-shaped member movable in at least three degrees of freedom within a two-dimensional plane560US 7,489,389 B2Nikon Corporation · 2009
- Position measurement method, position control method, measurement method, loading method, exposure method and exposure apparatus, and device manufacturing method557US 8,072,578 B2Nikon Corporation · 2011