Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method

A support table comprising:

• a support section, configured to support a lower surface of a substrate on an upper side thereof;
• a conditioning system, configured to supply heat energy to and/or remove heat energy from the support section, the conditioning system comprising a channel configured to permit flow within the support section of a heat transfer fluid;
• and
• a heater configured to supply heat energy, wherein the heater comprises a plurality of heater parts and the channel comprises a plurality of channel parts, wherein the heater parts and channel parts are located under the lower surface of the substrate when the substrate is supported on the support section and at least one of the heater parts extends to a location lower than the channel parts and to a location higher than the channel parts.

A support structure comprising:

• a support section, configured to support a lower surface of a substrate on an upper side thereof;
• a channel configured to permit flow within the support structure of a heat transfer fluid, the channel comprising a plurality of channel parts through which fluid can flow;
• and
• a heater configured to supply heat energy and comprising a plurality of heater parts, each heater part configured to supply heat energy,
• wherein the heater parts and channel parts are located under the lower surface of the substrate when the substrate is supported on the support section and wherein at least one of the heater parts is at least partially located underneath at least one of the channel parts.